Exposure apparatus and device manufacturing method

• US 8,004,650 B2
• Filed: 06/08/2005
• Issued: 08/23/2011
• Est. Priority Date: 12/10/2002
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hirukawa, Shigeru
• Primary Examiner(s): Glick; Edward J
• Assistant Examiner(s): Asfaw; Mesfin T
• Application Number:
  US11/147,285
• Publication Number:
  US 20050259234A1
• Time in Patent Office: 2,267 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77, 430/311
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

Liquid is supplied by a supply mechanism to a space between a lens and a wafer via a supply nozzle on one side of the lens, and the liquid is recovered by a recovery mechanism via a recovery pipe on the other side of the lens. When the supply and the recovery of the liquid are performed in parallel, a predetermined amount of liquid (exchanged at all times) is held between the lens and the substrate on the stage. Accordingly, when exposure (pattern transfer on the substrate) is performed in this state, an immersion method is applied and a pattern is transferred with good precision onto the substrate. In addition, in the case the liquid leaks out from under the lower edge of a peripheral wall, the liquid that could not be recovered is recovered by an auxiliary recovery mechanism via a slit. And, by such operations, the substrate is freed from the residual liquid on the substrate.

Claims

1. A method of irradiating a layer including:

directing and focusing a radiation beam to a spot on said layer by means of at least one optical element;

causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between a surface of said at least one optical element nearest to said layer is maintained; and

maintaining at least a portion of said interspace through which said radiation irradiates said spot on said layer filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening;

wherein the outflow opening via which the liquid flows out onto the layer is provided in the form of at least one canal that includes an elongated open portion that opens towards said layer, said canal distributing supplied liquid longitudinally along said canal and said elongated open portion of said canal dispensing distributed liquid towards said layer,

wherein at least a portion of said liquid fills up a recess through which said radiation irradiates said spot.

2. A method according to claim 1, wherein the at least one canal is positioned such that, seen in a direction perpendicular to said layer, the canal defines a total cross-sectional area having a center in said portion of said interspace through which the radiation irradiates the spot.

3. A method according to claim 1, wherein a thickness of said interspace is maintained at 3 mm and under.

4. A method according to claim 1, wherein the recess is defined in part by a rim portion closest to said layer extending around said radiation irradiating said spot, said rim portion disposed farther from an optical axis of said radiation beam than is said elongated open portion of said canal.

5. A method according to claim 1, wherein said recess is defined in part by a portion of said surface of said at least one optical element nearest to said layer.

6. A device for directing radiation to a layer including:

at least one optical element for focusing a beam of radiation originating from a radiation source to a spot on said layer;

a displacement structure for causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between said layer and a surface of said at least one optical element nearest to said spot is maintained; and

an outflow opening for supplying liquid to at least a portion of said interspace through which, in operation, said radiation irradiates said spot on said layer, said outflow opening supplying the liquid onto the layer and having a total projected cross-sectional passage area in a plane perpendicular to an axis of said radiation beam;

wherein the at least one outflow opening is formed by at least one canal that includes an elongated open portion that opens towards said layer, said canal distributing supplied liquid longitudinally along said canal and said elongated open portion of said canal dispensing distributed liquid towards said layer,

wherein a recess is provided in a surface facing said spot, an internal surface of said recess bounding at least said portion of said interspace through which said radiation irradiates said spot.

7. A device according to claim 6, wherein the outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction parallel to said axis of said radiation beam, said total cross-sectional area has a center in said portion of said gap through which the radiation irradiates the spot.

8. A device according to claim 6, wherein said displacement structure and said recess are positioned and dimensioned for maintaining a thickness of said interspace at 3 mm and under.

9. A device according to claim 6, wherein said recess is defined in part by a rim portion closest to said layer extending around said portion of said interspace through which, in operation, said radiation irradiates said spot, said rim portion disposed farther from an optical axis of said radiation than is said elongated open portion of said canal.

10. A device according to claim 6, wherein said recess is defined in part by a portion of said surface of said at least one optical element nearest to said spot.

11. A method of irradiating a layer including:

directing and focusing a radiation beam to a spot on said layer by means of at least one optical element;

causing relative movement of the layer relative to said at least one optical element while performing the directing and focusing of said radiation beam to the spot on the layer so that, successively, different portions of the layer are irradiated and an interspace between a surface of said at least one optical element nearest to said layer is maintained; and

maintaining at least a portion of said interspace through which said radiation irradiates said spot on said layer filled with a liquid, the liquid being supplied via a supply conduit having at least one outflow opening by which the liquid is supplied onto the layer, the liquid being removed by an exhaust conduit having at least one inflow opening by which the liquid is removed from the interspace;

wherein at least a portion of said liquid fills up a recess through which said radiation irradiates said spot, said recess having a size smaller than a size of the layer when viewed in a direction of an optical axis of the at least one optical element nearest to the layer, such that only a portion of the surface of the layer is covered by the liquid, and

said recess in which the inflow opening is provided is in fluid communication with the at least one outflow opening and the layer.

12. A method according to claim 11, wherein the recess is defined in part by a rim portion closest to said layer extending around said radiation irradiating said spot, said rim portion disposed farther from an optical axis of said radiation than is said at least one outflow opening.

13. A method according to claim 11, wherein said recess is bounded by a passage in a wall between said layer and a surface of said at least one optical element nearest to said layer and by said at least one optical element nearest to said layer.

14. A method according to claim 13, wherein a liquid outflow via said passage is maintained.

15. A method according to claim 11, wherein a thickness of said interspace is maintained at 3 mm and under.

16. A method according to claim 11, wherein said recess is defined in part by a portion of said surface of said at least one optical element nearest to said layer.

17. A method according to claim 11, wherein the at least one outflow opening is in the form of at least one canal open towards said layer, said canal distributing supplied liquid longitudinally along said canal and dispensing distributed liquid towards said layer.

18. A method according to claim 11, wherein said interspace between said layer and said surface of said at least one optical element nearest to said layer has a thickness, the layer and the at least one optical element are moved relative to each other at a velocity, and the outflow opening has a width in a plane parallel to said layer.

19. A device for directing radiation to a layer including:

at least one optical element for focusing radiation originating from a radiation source to a spot on said layer;

a displacement structure for causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between said layer and a surface of said at least one optical element nearest to said spot is maintained;

an outflow opening for supplying liquid to at least a portion of said interspace through which, in operation, said radiation irradiates said spot on said layer, said outflow opening supplying the liquid onto the layer;

an inflow opening by which the liquid is removed from the interspace; and

a recess in a surface facing said spot, an internal surface of said recess bounding at least said portion of said interspace through which said radiation irradiates said spot,

wherein the inflow opening is provided inside the recess, and

the recess is in fluid communication with the outflow opening and the layer.

20. A device according to claim 19, wherein said recess is defined in part by a rim portion closest to said layer extending around said portion of said interspace through which, in operation, said radiation irradiates said spot, said rim portion disposed farther from an optical axis of said radiation than is said outflow opening.

21. A device according to claim 19, wherein said recess is bounded by a passage in a wall between said spot and a surface of said at least one optical element nearest to said spot and by said surface of said at least one optical element nearest to said spot.

22. A device according to claim 21, further including a liquid supply structure communicating with said passage for maintaining a liquid outflow via said passage.

23. A device according to claim 19, arranged for maintaining a thickness of said interspace at 3 mm and under.

24. A device according to claim 19, wherein said recess is defined in part by a portion of said surface of said at least one optical element nearest to said spot.

25. A device according to claim 19, wherein the at least one outflow opening is formed by at least one canal open towards said layer, for distributing supplied liquid longitudinally along said canal and dispensing distributed liquid towards said layer.