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Method and apparatus for inspecting pattern defects

  • US 8,005,292 B2
  • Filed: 09/07/2010
  • Issued: 08/23/2011
  • Est. Priority Date: 11/20/2003
  • Status: Expired due to Fees
First Claim
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1. An apparatus for inspecting pattern defects, the apparatus comprising:

  • an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory;

    a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and

    a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit,wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.

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