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Plasma processing apparatus and plasma processing method

  • US 8,006,640 B2
  • Filed: 03/26/2007
  • Issued: 08/30/2011
  • Est. Priority Date: 03/27/2006
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising:

  • a process container configured to hold a vacuum therein and perform a plasma process on a target object accommodated therein, the process container including a container casing that is equipped with an upper plate disposed on an upper side thereof and defining a top opening, and a dielectric transmission plate supported by the upper plate and airtightly closing the top opening;

    a worktable configured to place the target object thereon inside the process container;

    a planar antenna disposed above the transmission plate and including a plurality of slots to supply microwaves from the slots through the transmission plate into the process container;

    a gas feed member configured to supply a process gas, to be turned into plasma by the microwaves, into the process container;

    an exhaust line configured to exhaust gas from inside the process container;

    a dielectric wave-retardation body disposed above the planar antenna and configured to shorten a wavelength of the microwaves; and

    a metal cover covering the planar antenna and the wave-retardation body,wherein the planar antenna is fixed at a periphery of the planar antenna to the metal cover by fixing members, which are fitted in a recess formed on the transmission plate at a periphery of the transmission plate, andthe transmission plate is set at a position where the transmission plate is separated from the target object placed on the worktable by a distance of from 20 mm to 100 mm.

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