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Fuzzy control method for adjusting a semiconductor machine

  • US 8,010,212 B2
  • Filed: 09/30/2008
  • Issued: 08/30/2011
  • Est. Priority Date: 04/09/2008
  • Status: Active Grant
First Claim
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1. A fuzzy control method for adjusting a semiconductor machine, applied to the semiconductor machine in a semiconductor manufacturing process, the method comprising:

  • providing a machine measurement parameter of a pre-semiconductor manufacturing process, a machine measurement parameter of the semiconductor manufacturing process, and a machine operation parameter of the semiconductor manufacturing process;

    determining a difference between the machine measurement parameter of the pre-semiconductor manufacturing process and the machine operation parameter, and determining another difference between the machine measurement parameter of the semiconductor manufacturing process and the machine operation parameter of the semiconductor manufacturing process;

    executing a fuzzy deciding operation on basis of a first parameter input value and a second parameter input value, and selecting a machine adjusting level of the semiconductor manufacturing process accordingly, wherein the difference between the machine measurement parameter of the pre-semiconductor manufacturing process and the machine operation parameter of the semiconductor manufacturing process is defined as the first parameter input value, the difference between the machine measurement parameter of the semiconductor manufacturing process and the machine operation parameter of the semiconductor manufacturing process is defined as the second parameter input value, defining a parameter output value and setting a machine control parameter of the semiconductor manufacturing process to the parameter output value; and

    determining whether the machine control parameter of the semiconductor manufacturing process surpasses an acceptable range, wherein, when the machine control parameter of the semiconductor manufacturing process surpasses the acceptable range, repeating the above steps;

    otherwise utilizing the machine control parameter of the semiconductor manufacturing process for adjusting the machine.

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