Molded waveguides

• US 8,012,382 B2
• Filed: 03/04/2009
• Issued: 09/06/2011
• Est. Priority Date: 03/15/1996
• Status: Expired due to Fees

• Current Assignee: President and Fellows of Harvard College (Harvard Corporation)
• Original Assignee: President and Fellows of Harvard College (Harvard Corporation)
• Inventors: Whitesides, George M., Xia, Younan, Smith, Stephen P., Zhao, Xiao-Mei, Kim, Enoch, Prentiss, Mara G., Jackman, Rebecca J., Mrksich, Milan, Marzolin, Christian
• Primary Examiner(s): Nguyen; Khanh
• Assistant Examiner(s): Hoover; Matthew
• Application Number:
  US12/398,132
• Publication Number:
  US 20090166903A1
• Time in Patent Office: 916 Days
• Field of Search: 264/1.24, 264/1.27, 264/112, 264/259, 264/260, 264/496, 264/621, 264298-299, 264/494, 216/44
• US Class Current: 264/1.24
• CPC Class Codes: A61K 47/6957 the form being a device or a kit, e.g. stents or microdevices
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00382 Stamping
• CPC Class Codes: B01J 2219/00416 Vacuum
• CPC Class Codes: B01J 2219/0043 for direct application of reagents, e.g. through openings in a shutter
• CPC Class Codes: B01J 2219/00466 in a slurry
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/0061 The surface being organic
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00619 using hydrophilic or hydrophobic regions
• CPC Class Codes: B01J 2219/00626 Covalent
• CPC Class Codes: B01J 2219/0063 Other, e.g. van der Waals forces, hydrogen bonding
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00648 by the use of solid beads
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00713 Electrochemical synthesis
• CPC Class Codes: B29C 31/04 Feeding of the material to be moulded, e.g. into a mould cavity B29C39/08 takes precedence; using a material distribution system to two or more fixed injection moulds B29C45/125
• CPC Class Codes: B29C 33/42 characterised by the shape of the moulding surface, e.g. ribs or grooves
• CPC Class Codes: B29C 37/0053 Moulding articles characterised by the shape of the surface, e.g. ribs, high polish mould construction therefor B29C33/42; surface shaping of articles B29C59/00; by incorporating filler in or near the surface B29C70/64
• CPC Class Codes: B29C 39/24 Feeding the material into the mould
• CPC Class Codes: B29C 43/021 : characterised by the shape of the surface
• CPC Class Codes: B29C 67/246 : Moulding high reactive monomers or prepolymers, e.g. by reaction injection moulding [RIM], liquid injection moulding [LIM] casting monomers B29C39/006, mixing construction B29B7/74
• CPC Class Codes: B29D 11/00346 : having nanosize structures or features, e.g. fillers
• CPC Class Codes: B29D 11/00663 : Production of light guides
• CPC Class Codes: B29K 2105/0002 : monomers or prepolymers
• CPC Class Codes: B29L 2011/0016 : Lenses
• CPC Class Codes: B81B 2201/0214 : Biosensors; Chemical sensors
• CPC Class Codes: B81C 1/00031 : Regular or irregular arrays of nanoscale structures, e.g. etch mask layer photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002
• CPC Class Codes: B81C 1/00206 : Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
• CPC Class Codes: B81C 2201/034 : Moulding
• CPC Class Codes: B81C 99/0085 : using moulds and master templates, e.g. for hot-embossing
• CPC Class Codes: B82Y 30/00 : Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C40B 60/14 : for creating libraries
• CPC Class Codes: G01N 2021/7776 : Index
• CPC Class Codes: G01N 21/7703 : using reagent-clad optical fibres or optical waveguides using measurement of total internal reflection or attenuated total reflection G01N21/552; optical fibres or waveguides per se G02B
• CPC Class Codes: G02B 6/138 : by using polymerisation
• CPC Class Codes: H05K 3/0079 : characterised by the method of application or removal of the mask H05K3/0091 takes precedence
• CPC Class Codes: H05K 3/061 : Etching masks

Abstract

Chemically or biochemically active agents or other species are patterned on a substrate surface by providing a micromold having a contoured surface and forming, on a substrate surface, a chemically or biochemically active agent or fluid precursor of a structure. A chemically or biochemically active agent or fluid precursor also can be transferred from indentations in an applicator to a substrate surface. The substrate surface can be planar or non-planar. Fluid precursors of polymeric structures, inorganic ceramics and salts, and the like can be used to form patterned polymeric articles, inorganic salts and ceramics, reactive ion etch masks, etc. at the surface. The articles can be formed in a pattern including a portion having a lateral dimension of less than about 1 millimeter or smaller. The indentation pattern of the applicator can be used to transfer separate, distinct chemically or biochemically active agents or fluid precursors to separate, isolated regions of a substrate surface. Waveguide arrays, combinatorial chemical or biochemical libraris, etc. can be made. Differences in refractive index of waveguide and cladding can be created by subjecting the waveguide and cladding, made of indentical prepolymeric material, to different polymerization or cross-linking conditions. Interferometers are defined by coupling arrays of waveguides, where coupling can be controlled by altering the difference in refractive index between cladding and waveguide at any desired location of the array. Alteration and refractive index can be created photochemically, chemically, or the like. Sensors also are disclosed, including biochemical sensors.

Claims

1. A method of forming a structure, the method comprising:

providing an article comprising an elastomer having a contoured surface including at least one indentation defining a pattern, the pattern having at least one lateral dimension of about 1 mm or less;

applying a liquid precursor to the contoured surface of the article to fill the at least one indentation;

contacting the surface of the filled article with a substrate to transfer the liquid precursor from the filled article to the substrate in a pattern corresponding to the at least one indentation, wherein the liquid precursor is confined to a first region proximate the substrate surface defined by the at least one indentation;

hardening the liquid precursor to form a structure having a three-dimensional shape corresponding to the at least one indention; and

removing the article having at least one indentation therein from the substrate.

2. The method of claim 1, further comprising removing the structure from the substrate.

3. The method of claim 2, wherein a lateral dimension the structure is retained during the removing.

4. The method of claim 1, wherein the hardening comprises dissipating a solvent from the liquid precursor.

5. The method of claim 1, wherein the hardening occurs after the removing.

6. The method of claim 1, wherein the structure is an isolated structure.

7. The method of claim 1, further comprising applying pressure to the article during the contacting.

8. The method of claim 1, further comprising applying a composition comprising a chemically active agent to a second region proximate the substrate surface defined by the structure;

and reacting the composition comprising a chemically active agent with the second region of the substrate.

9. A method of forming a structure, the method comprising:

applying a liquid precursor to a substrate;

contacting a contoured surface of an article comprising an elastomer with at least the liquid precursor, the contoured surface including at least one indentation defining a pattern, the pattern having at least one lateral dimension of about 1 mm or less, wherein the contacting fills the at least one indentation with the liquid precursor;

hardening the fluidic liquid precursor to provide a structure having a three-dimensional shape, at least a portion of which corresponds to the at least one indentation; and

removing the article from the substrate.

10. The method of claim 9, further comprising removing the structure from the substrate.

11. The method of claim 10, wherein a lateral of the structure is retained during the removing.

12. The method of claim 9, wherein the hardening comprises dissipating a solvent from the liquid precursor.

13. The method of claim 9, wherein the hardening occurs after the removing.

14. The method of claim 9, wherein the structure is an isolated structure.

15. The method of claim 9, further comprising applying pressure to the article during the contacting.

16. The method of claim 9, wherein the contacting further comprises contacting the article with the substrate to confine the liquid precursor to a first region proximate the substrate surface defined by the at least one indentation.

17. The method of claim 16, further comprising applying a composition comprising a chemically active agent to a second region proximate the substrate surface defined by the structure;

and reacting the composition comprising a chemically active agent with the second region of the substrate.

18. A method of promoting a chemical reaction on a substrate, the method comprising:

contacting a contoured surface of an article comprising an elastomer with a substrate, the contoured surface including at least one indentation defining a pattern, the pattern having at least one lateral dimension of about 1 mm or less, wherein the contacting confines a liquid composition comprising a chemically active agent to a first region proximate the substrate surface defined by the at least one indentation;

reacting the composition comprising a chemically active agent with the first region of the substrate; and

removing the article from the substrate.

19. The method of claim 18, further comprising, prior to the contacting, applying a composition comprising a chemically active agent to a substrate.

20. The method of claim 19, further comprising uniformly applying the composition comprising a chemically active agent to a substrate.

21. The method of claim 18, further comprising applying pressure to the article during the contacting.

22. The method of claim 18, wherein the reacting occurs after the removing.

23. A method of forming a structure, the method comprising:

providing an article comprising an elastomer having a contoured surface including at least one indentation defining a pattern, the pattern having at least one lateral dimension of about 1 mm or less, the article being in contact with a substrate surface;

forming at a first region proximate the contoured surface of the article, in a pattern corresponding to the indentation pattern, a liquid precursor of a structure by applying the liquid precursor to the contoured surface of the article to fill the at least one indentation; and

allowing the liquid precursor to harden to form a structure at the first region of the surface while leaving a second region proximate the substrate surface, contiguous with the first region, free of the liquid precursor, the structure having a three-dimensional shape corresponding to the at least one indention.

24. A method as in claim 23, involving allowing the liquid precursor to harden to form the structure at the first region of the contoured surface in a pattern corresponding to the indentation pattern and in an area including a portion having a lateral dimension of less than about 1 mm.

25. The method of claim 23, wherein a lateral dimension the structure is retained during the removing.

26. The method of claim 23, wherein the hardening comprises dissipating a solvent from the liquid precursor.

27. The method of claim 23, wherein the hardening occurs after the removing.

28. The method of claim 23, wherein the structure is an isolated structure.

29. The method of claim 23, further comprising applying a composition comprising a chemically active agent to a second region proximate the contoured surface defined by the structure;

and reacting the composition comprising a chemically active agent with the second region of the contoured surface.

30. The method of claim 29, wherein the structure is a reactive ion etch mask and the applying and the reacting comprises reactive ion etching.

31. The method of claim 23, further comprising removing the structure from the article.