Monomeric formulation for making polymer waveguides
First Claim
1. A monomeric formulation for the fabrication of self-propagating polymer waveguides by photopolymerization, the monomeric formulation comprising:
- a first molecule comprising at least one C═
C double bond or C≡
C triple bond;
a second molecule comprising two or more SH groups;
a photoinitiator selected from the group consisting of 2,2-dimethoxy-2-phenylacetophenone;
2-hydroxy-2-methylpropiophenone;
camphorquinone;
benzophenone; and
benzoyl peroxide, and combinations thereof; and
a free radical inhibitor comprising a compound selected from the group consisting of methylhydroquinone, ethylhydroquinone, methoxyhydroquinone, ethoxyhydroquinone, monomethylether hydroquinone, propylhydroquinone, propoxyhydroquinone, tert-butylhydroquinone, n-butylhydroquinone, and combinations thereof, the free radical inhibitor being present at a positive amount between 0-3% by weight of the monomeric formulation, and the free radical inhibitor being present in an amount sufficient to reduce polymerization of the monomeric formulation outside the waveguides while propagating the polymer waveguides.
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Accused Products
Abstract
A monomeric formulation for creating self-propagating polymer optical waveguides and a system and a method of using the same. The monomeric formulation includes a plurality of unsaturated molecules, a molecule having a structure of R—X—H (e.g., X═O, S, N), and a photoinitiator. The monomeric formulation can further include a free radical inhibitor. The system includes a light source, a reservoir having a monomeric formulation and a patterning apparatus configured to guide a light beam from the light source into the monomeric formulation to form at least one self-propagating polymer waveguide.
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Citations
24 Claims
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1. A monomeric formulation for the fabrication of self-propagating polymer waveguides by photopolymerization, the monomeric formulation comprising:
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a first molecule comprising at least one C═
C double bond or C≡
C triple bond;a second molecule comprising two or more SH groups; a photoinitiator selected from the group consisting of 2,2-dimethoxy-2-phenylacetophenone;
2-hydroxy-2-methylpropiophenone;
camphorquinone;
benzophenone; and
benzoyl peroxide, and combinations thereof; anda free radical inhibitor comprising a compound selected from the group consisting of methylhydroquinone, ethylhydroquinone, methoxyhydroquinone, ethoxyhydroquinone, monomethylether hydroquinone, propylhydroquinone, propoxyhydroquinone, tert-butylhydroquinone, n-butylhydroquinone, and combinations thereof, the free radical inhibitor being present at a positive amount between 0-3% by weight of the monomeric formulation, and the free radical inhibitor being present in an amount sufficient to reduce polymerization of the monomeric formulation outside the waveguides while propagating the polymer waveguides. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A monomeric formulation for the fabrication of self-propagating polymer waveguides by photopolymerization, the monomeric formulation comprising:
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a first molecule comprising at least one functional group selected from the group consisting of ethynyl, vinyl ether, vinyl ester, vinyl amide, vinyl triazine, vinyl isocyanurate, acrylate, methacrylate, diene, and triene; a second molecule comprising two or more —
SH groups;a photoinitiator; and a free radical inhibitor comprising a compound selected from the group consisting of methylhydroquinone, ethylhydroquinone, methoxyhydroquinone, ethoxyhydroquinone, monomethylether hydroquinone, propylhydroquinone, propoxyhydroquinone, tert-butylhydroquinone, n-butylhydroquinone, and combinations thereof, the free radical inhibitor being present at a positive amount between 0-3% by weight of the monomeric formulation, the free radical inhibitor being present in an amount sufficient to reduce polymerization of the monomeric formulation outside the waveguides while propagating the polymer waveguides. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A system for forming at least one self-propagating polymer waveguide by photopolymerization, the system comprising:
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a collimated light source for producing a light beam; a reservoir having a monomeric formulation adapted to polymerize under a light exposure generated by the light beam; and a patterning apparatus configured to guide a portion of the light beam into the monomeric formulation to form at least one polymer waveguide through a portion of a volume of the monomeric formulation, wherein the monomeric formulation comprises; a first molecule comprising at least one C═
C double bond or C≡
C triple bond;a second molecule comprising two or more —
SH groups;a photoinitiator selected from the group consisting of 2,2-dimethoxy-2-phenylacetophenone;
2-hydroxy-2-methylpropiophenone;
camphorquinone;
benzophenone; and
benzoyl peroxide; anda free radical inhibitor comprising a compound selected from the group consisting of methylhydroquinone, ethylhydroquinone, methoxyhydroquinone, ethoxyhydroquinone, monomethylether hydroquinone, propylhydroquinone, propoxyhydroquinone, tert-butylhydroquinone, n-butylhydroquinone, and combinations thereof, the free radical inhibitor being present at a positive amount between 0-3% by weight of the monomeric formulation, and the free radical inhibitor being present in an amount sufficient to reduce polymerization of the monomeric formulation outside the waveguides while propagating the polymer waveguides.
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24. A method for forming at least one polymer waveguide, the method comprising:
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forming a volume of a monomeric formulation comprising a first molecule comprising at least one C═
C double bond or C≡
C triple bond;
a second molecule comprising two or more —
SH groups;
a photoinitiator; and
a free radical inhibitor comprising a compound selected from the group consisting of methylhydroquinone, ethylhydroquinone, methoxyhydroquinone, ethoxyhydroquinone, monomethylether hydroquinone, propylhydroquinone, propoxyhydroquinone, tert-butylhydroquinone, n-butylhydroquinone, and combinations thereof, the free radical inhibitor being present at a positive amount between 0-3% by weight of the monomeric formulation, and the free radical inhibitor being present in an amount sufficient to reduce polymerization of the monomeric formulation outside the waveguides while propagating the polymer waveguides;securing a mask having at least one aperture between a collimated light source and the volume of the monomeric formulation; and directing a collimated light beam from the collimated light source to the mask for a period of exposure time so that a portion of the collimated beam passes through the mask and is guided by the at least one aperture into the volume of the monomeric formulation to form at least one waveguide through a portion of the volume of the monomeric formulation.
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Specification