Semiconductor image sensor and method for fabricating the same
First Claim
Patent Images
1. A method for fabricating a semiconductor image sensor, comprising the steps of:
- (a) bonding a transparent sheet array having grooves formed therein to a circuit-formation surface of a semiconductor imaging element array, in which a plurality of semiconductor imaging elements each including electrode terminals are formed, in such a manner that the electrode terminals are located inside the grooves, the grooves being formed in portions in the transparent sheet array that correspond to regions in which the electrode terminals are formed;
(b) polishing the transparent sheet array until the bottom of each groove is reached, thereby forming a transparent sheet on each of the semiconductor imaging elements; and
(c) dicing the semiconductor imaging element array into individual pieces, in each of which one of the semiconductor imaging elements is formed.
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Abstract
A semiconductor image sensor includes: a semiconductor imaging element including an imaging area, a peripheral circuit area, and an electrode area; cylindrical electrodes provided on electrode terminals so as to be electrically connected with an external device; and a transparent resin layer provided on the upper surface of the semiconductor imaging element. The upper surface of each cylindrical electrode and the upper surface of the transparent resin layer are substantially of the same height.
7 Citations
16 Claims
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1. A method for fabricating a semiconductor image sensor, comprising the steps of:
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(a) bonding a transparent sheet array having grooves formed therein to a circuit-formation surface of a semiconductor imaging element array, in which a plurality of semiconductor imaging elements each including electrode terminals are formed, in such a manner that the electrode terminals are located inside the grooves, the grooves being formed in portions in the transparent sheet array that correspond to regions in which the electrode terminals are formed; (b) polishing the transparent sheet array until the bottom of each groove is reached, thereby forming a transparent sheet on each of the semiconductor imaging elements; and (c) dicing the semiconductor imaging element array into individual pieces, in each of which one of the semiconductor imaging elements is formed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for fabricating a semiconductor device, comprising the steps of:
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(a) bonding a transparent sheet array having grooves formed therein to a circuit-formation surface of a semiconductor element array, in which a plurality of semiconductor elements each including electrode terminals are formed, in such a manner that the electrode terminals are located inside the grooves, the grooves being formed in portions in the transparent sheet array that correspond to regions in which the electrode terminals are formed; (b) polishing the transparent sheet array until the bottom of each groove is reached, thereby forming a transparent sheet on each of the semiconductor elements; and (c) dicing the semiconductor element array into individual pieces, in each of which one of the semiconductor elements is formed. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification