Method of making a liquid crystal display device capable of increasing capacitance of storage capacitor
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- forming a gate line and a gate electrode having a double-layer structure with a transparent conductive layer and a gate pattern including a lower storage electrode having the transparent conductive layer on a substrate using a first mask;
forming a gate insulating film covering the gate pattern, and forming a semiconductor layer, a source/drain layer and a data line on the gate insulating film using a second mask; and
forming a passivation film having a pixel hole and forming a pixel electrode connected to the drain electrode and overlapping with the lower storage electrode on the gate insulating film within the pixel hole using a third mask, wherein the pixel electrode is directly formed on the gate insulating film.
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Abstract
A thin film transistor substrate and a fabricating method simplify a process and enlarge a capacitance value of a storage capacitor without any reduction of aperture ratio. A transparent first conductive layer and an opaque second conductive layer of a double-layer structured gate line are formed having a step coverage. A pixel electrode is provided on the gate insulating film within a pixel hole of said pixel area passing through the passivation film to be connected to the thin film transistor. A storage capacitor overlaps with the pixel electrode with having the gate insulating film therebetween and has a lower storage electrode protruded from the first conductive layer.
31 Citations
20 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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forming a gate line and a gate electrode having a double-layer structure with a transparent conductive layer and a gate pattern including a lower storage electrode having the transparent conductive layer on a substrate using a first mask; forming a gate insulating film covering the gate pattern, and forming a semiconductor layer, a source/drain layer and a data line on the gate insulating film using a second mask; and forming a passivation film having a pixel hole and forming a pixel electrode connected to the drain electrode and overlapping with the lower storage electrode on the gate insulating film within the pixel hole using a third mask, wherein the pixel electrode is directly formed on the gate insulating film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification