Method of manufacturing semiconductor active layer, method of manufacturing thin film transistor using the same and thin film transistor having semiconductor active layer
First Claim
Patent Images
1. A method of manufacturing an IGZO active layer, the method comprising:
- depositing ions including In, Ga, and Zn from a first target; and
depositing ions including In from a second target having a different atomic composition from the first target, the second target being made of InZnO, wherein the deposition of ions from the second target is controlled to adjust an atomic % of In in the IGZO layer to be about 45 atomic % to about 80 atomic %.
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Abstract
A method of manufacturing an IGZO active layer includes depositing ions including In, Ga, and Zn from a first target, and depositing ions including In from a second target having a different atomic composition from the first target. The deposition of ions from the second target may be controlled to adjust an atomic % of In in the IGZO layer to be about 45 atomic % to about 80 atomic %.
12 Citations
20 Claims
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1. A method of manufacturing an IGZO active layer, the method comprising:
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depositing ions including In, Ga, and Zn from a first target; and depositing ions including In from a second target having a different atomic composition from the first target, the second target being made of InZnO, wherein the deposition of ions from the second target is controlled to adjust an atomic % of In in the IGZO layer to be about 45 atomic % to about 80 atomic %. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of manufacturing a thin film transistor, the method comprising:
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forming an IGZO active layer on a substrate; forming a gate electrode spaced apart from the IGZO active layer by a gate dielectric layer; forming a source electrode that contacts a first portion of the IGZO active layer; and forming a drain electrode that contacts a second portion of the IGZO active layer, wherein forming the IGZO active layer includes; depositing ions including In, Ga, and Zn from a first target, and depositing ions including In from a second target having a different atomic composition from the first target, the second target being made of InZnO, the deposition of ions from the second target being controlled to adjust an atomic % of In in the IGZO layer to be about 45 atomic % to about 80 atomic %. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification