Exposure apparatus, and device manufacturing method

• US 8,018,575 B2
• Filed: 01/27/2006
• Issued: 09/13/2011
• Est. Priority Date: 06/19/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Ebihara, Akimitsu
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/340,680
• Publication Number:
  US 20060132740A1
• Time in Patent Office: 2,055 Days
• Field of Search: 355/30, 355/53, 355/67, 355 72- 76, 250/548
• US Class Current: 355/53
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70325 Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
• CPC Class Codes: G03F 7/70333 Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

A hydrostatic pad (32) and a hydrostatic pad (34) hold a wafer (W) and a table (TB) on which the wafer is mounted. The hydrostatic pad (32) maintains the distance between the bearing surface and the wafer (W) in the direction of the optical axis of a projection optical system (PL) at a predetermined value. Further, since the hydrostatic pads, unlike static gas bearings, utilize the static pressure of incompressible fluid (liquid) between the bearing surface and a support object (substrate), the rigidity of the bearing is high and the distance between the bearing surface and the substrate is maintained stable and constant. In addition, liquid (e.g., pure water) is higher in viscosity than gas (e.g., air), and is superior in vibration damping compared to gas. Accordingly, pattern transfer on a wafer (substrate) substantially free from defocus can be achieved, without necessarily having to arrange a focal position detection system.

Claims

1. A lithographic projection apparatus comprising:

a substrate table which holds a substrate;

a projection system which projects a patterned beam onto a target portion of the substrate;

a liquid supply system which provides an immersion liquid, through which the beam is to be projected, in a space between the projection system and the substrate;

a plate member; and

a controller that controls movement of the plate member so that the plate member is moved to keep the projection system in contact with liquid when the substrate table holding the substrate is moved away from under the projection system,

wherein the plate member is separate from the substrate table, and

wherein the controller moves the plate member, when keeping the projection system in contact with liquid, so as to position the plate member opposite the liquid supply system.

2. An apparatus according to claim 1, wherein the plate member is positioned opposite the liquid supply system such that liquid can be confined between the liquid supply system and the plate member and between the projection system and the plate member.

3. An apparatus according to claim 1, wherein the liquid supply system comprises a liquid confinement structure which extends along at least part of the boundary of the space to contain the immersion liquid and which comprises a low pressure outlet.

4. An apparatus according to claim 1, wherein, in a position, the plate member has a primary surface substantially co-planar with a surface of the substrate on the substrate table.

5. An apparatus according to claim 1, wherein the plate member comprises a guide mark.

6. An apparatus according to claim 5, comprising a sensor configured to measure a position of the plate member using the guide mark.

7. An apparatus according to claim 1, wherein the liquid supply system comprises a liquid confinement structure extending along at least a part of the boundary of the space.

8. An apparatus according to claim 1, wherein the liquid supply system comprises an outlet configured to remove liquid from the space.

9. An apparatus according to claim 1, wherein the liquid supply system comprises at least one inlet to supply the immersion liquid onto the substrate and at least one outlet to remove the immersion liquid after the liquid has passed under the projection system.

16. An apparatus according to claim 1, wherein the controller controls the movement of the plate member to keep the projection system in contact with liquid when the substrate table holding the substrate is moved away from under the projection system by:

locating the plate member closely adjacent to the substrate table that holds the substrate; and

simultaneously moving the substrate table and the plate member in a same direction until the plate member has replaced the substrate table under the projection system.

10. A device manufacturing method comprising:

providing an immersion liquid to a space between a projection system and a substrate;

projecting a patterned beam of radiation, through the liquid, onto a target portion of the substrate using the projection system; and

moving a plate member to maintain the projection system in contact with liquid after a substrate table holding the substrate has been moved away from under the projection system;

wherein the plate member is separate from the substrate table, and

wherein the plate member is moved, when keeping the projection system in contact with liquid, so as to position the plate member opposite a liquid supply system which is used to provide the immersion liquid to the space.

11. A method according to claim 10, wherein maintaining the projection system in contact with liquid comprises positioning the plate member opposite the liquid supply system such that liquid is confined between the liquid supply system and the plate member and between the projection system and the plate member.

12. A method according to claim 10, comprising measuring a position of the plate member using a guide mark.

13. A method according to claim 10, comprising removing liquid from the space.

14. A method according to claim 10, wherein providing the immersion liquid comprises supplying the immersion liquid onto the substrate through at least one inlet and removing the immersion liquid, after the liquid has passed under the projection system, through at least one outlet.

15. A method according to claim 10, comprising providing the liquid to a space between a final lens of the projection system and the substrate.

17. A method according to claim 10, wherein moving the plate member to keep the projection system in contact with liquid when the substrate table holding the substrate is moved away from under the projection system includes:

locating the plate member closely adjacent to the substrate table that holds the substrate; and

simultaneously moving the substrate table and the plate member in a same direction until the plate member has replaced the substrate table under the projection system.