Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device
First Claim
1. A method of making an electrode for a photovoltaic device, the method comprising:
- sputter-depositing a first transparent conductive oxide layer on a substrate using at least one ceramic sputtering target;
sputter-depositing a second transparent conductive oxide layer using at least one metallic sputtering target to form a transparent conductive oxide film comprising the first and second transparent conductive oxide layers, wherein the second transparent conductive oxide layer directly contacts the first transparent conductive oxide layer and is of the same metal oxide material as the first transparent conductive oxide layer; and
after said sputter-depositing steps, etching the transparent conductive oxide film to form a textured surface, wherein a substantial portion of the second transparent conductive oxide layer is removed during said etching and a majority of said first transparent conductive oxide layer remains after said etching.
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Abstract
Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process.
142 Citations
15 Claims
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1. A method of making an electrode for a photovoltaic device, the method comprising:
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sputter-depositing a first transparent conductive oxide layer on a substrate using at least one ceramic sputtering target; sputter-depositing a second transparent conductive oxide layer using at least one metallic sputtering target to form a transparent conductive oxide film comprising the first and second transparent conductive oxide layers, wherein the second transparent conductive oxide layer directly contacts the first transparent conductive oxide layer and is of the same metal oxide material as the first transparent conductive oxide layer; and after said sputter-depositing steps, etching the transparent conductive oxide film to form a textured surface, wherein a substantial portion of the second transparent conductive oxide layer is removed during said etching and a majority of said first transparent conductive oxide layer remains after said etching. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification