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Ferroelectric thin films

  • US 8,022,454 B2
  • Filed: 06/16/2010
  • Issued: 09/20/2011
  • Est. Priority Date: 07/07/2006
  • Status: Active Grant
First Claim
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1. A ferroelectric structure, comprising:

  • a first electrode comprising a first layer having a periodic atomic arrangement of platinum atoms;

    a ferroelectric thin film comprising a first termination and a second termination;

    wherein at least a portion of the platinum atoms of the first electrode is in epitaxial contact with at least a portion of the first termination of the ferroelectric thin film; and

    wherein the first termination of the ferroelectric thin film has a periodic atomic arrangement that approximately matches the periodic atomic arrangement of the platinum atoms of the first electrode.

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