System for detecting and estimating concentrations of gas or liquid analytes

• US 8,024,133 B2
• Filed: 11/26/2007
• Issued: 09/20/2011
• Est. Priority Date: 11/29/2006
• Status: Active Grant

• Current Assignee: California Institute of Technology
• Original Assignee: California Institute of Technology
• Inventors: Tran, Tuan A., Jewell, April D., Manfreda, Allison M., Zhou, Hanying, Jan, Darrell L., Taylor, Charles, Kisor, Adam, Manatt, Kenneth S., Shevade, Abhijit V., Yen, Shiao-Pin S., Ryan, Margaret A., Homer, Margie L.
• Primary Examiner(s): KHUU, HIEN DIEU THI
• Application Number:
  US11/986,784
• Publication Number:
  US 20100286929A1
• Time in Patent Office: 1,394 Days
• Field of Search: 702/24
• US Class Current: 702/24
• CPC Class Codes: G01N 27/121 for determining moisture content, e.g. humidity, of the fluid moisture content of the tested material G01N27/048

Abstract

A sensor system for detecting and estimating concentrations of various gas or liquid analytes. In an embodiment, the resistances of a set of sensors are measured to provide a set of responses over time where the resistances are indicative of gas or liquid sorption, depending upon the sensors. A concentration vector for the analytes is estimated by satisfying a criterion of goodness using the set of responses. Other embodiments are described and claimed.

Claims

1. A system comprising:

a set of sensors, each sensor having a resistance indicative of gas or liquid sorption by the sensor; and

a processing system to estimate values of a time derivative of resistance at various times for each sensor,

the processing system to estimate event occurrences for each sensor by comparing for each sensor the estimated values of the time derivative of the resistance to a threshold, and the processing system to estimate baseline resistance for each sensor, and to provide for each sensor for each event occurrence a response indicative of a change in the resistance divided by the baseline resistance associated with each event occurrence.

2. The system as set forth in claim 1, further comprising

a sensor to measure humidity;

the processing system to subtract from each response associated with each event occurrence a humidity response associated with each event occurrence based upon the measured humidity.

3. A system comprising:

a set of sensors, each sensor having a resistance indicative of gas or liquid sorption by the sensor;

a processing system to estimate values of a time derivative of resistance at various times for each sensor; and

a sensor to measure humidity;

the processing system to subtract from a response associated with an event occurrence for each sensor a humidity response associated with each event occurrence based upon the measured humidity.

4. A system comprising,

a set of n sensors, each sensor having a resistance R(i) indicative of gas or liquid sorption, where i ∈

[1, n] is an index indicating a sensor; and

a processing system to process a set of resistance measurements for each sensor for a set of times, the processing system to estimate time derivatives dR(i)/dt for the set of times and to declare an event occurrence if there is a sensor i for which the estimate of the time derivative dR(i)/dt satisfies a relationship with a threshold; and

the processing system to provide a set of responses dR(j)/R₀(j) for an event occurrence, where j is an index indicating a sensor belonging to the set of n sensors and j ∈

S where S is a subset of [1, n], S ⊂

[1, n], where dR(j) is a difference in resistance values for sensor j associated with the event occurrence and R₀(j) is an estimated baseline resistance value for sensor j associated with the event occurrence.

5. The system as set forth in claim 4, further comprising:

a humidity sensor to provide a measure of humidity; and

the processing system to provide a humidity response dR_H(j)/R_0H(j) for j ∈

S at the event occurrence based upon the measure of humidity, and to subtract the humidity response dR_H(j)/R_0H(j) from the set of responses dR(j)/R₀(j) to provide components for a vector response {right arrow over (y)}.

6. The system as set forth in claim 5, the processing system to provide a vector of concentrations {right arrow over (x)} to satisfy a criterion of goodness based upon a residual vector {right arrow over (y)}-ƒ

(A, {right arrow over (x)}) where ƒ

(A, {right arrow over (x)}) is a function of the vector of concentrations {right arrow over (x)} and system modeling parameter A.

7. The system as set forth in claim 6, where the function ƒ

(A, {right arrow over (x)}) is given by ƒ

(A, {right arrow over (x)})=A₁{right arrow over (x)}+A₂{right arrow over (x)}², where the i^th component of {right arrow over (x)}² is the square of the i^th component of {right arrow over (x)}, where A₁ and A₂ are matrices representing system modeling parameter A.

8. The system as set forth in claim 6, where the criterion of goodness is based upon a weighted residual

{right arrow over (r)}={right arrow over (w)}*({right arrow over (y)}−

ƒ

(A, {right arrow over (x)})),

where * denotes component by component multiplication.

9. The system as set forth in claim 8, where the vector of concentrations {right arrow over (x)} is updated by an update vector Δ

{right arrow over (x)} where

Δ

{right arrow over (x)}=V(D²+ε

l)<sup>−

1/2</sup>{right arrow over (g)}C<sup>−

1/2</sup>,

where ∈

is a scalar, where a Jacobian matrix J is calculated,

J=d {right arrow over (r)}/d{right arrow over (x)},

and a curvature matrix C is calculated,

C=J^†

J,

where †

denotes transposition and complex conjugation, where a matrix J_n is calculated based upon the Jacobian and curvature matrices,

J_n=JC^1/2,

followed by a singular value decomposition

J_n=UDV^†

where {right arrow over (g)}is calculated according to

{right arrow over (g)}=Jn^†

{right arrow over (r)}.

where I is an identity matrix chosen so that the dimension of ∈

I matches that of D.