Exposure apparatus, and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- a measuring system that measures characteristics of substrates in a first area of the apparatus;
a projection system that projects a patterned radiation beam onto a substrate in a second area of the apparatus;
a liquid confinement system that at least partly confines liquid in a space between the projection system and the substrate;
at least two substrate stages each of which holds a substrate; and
a positioning system that moves the stages between the first area and the second area, and during exposure, positions one of the stages holding a substrate in the second area on the basis of at least one measured characteristic of that substrate;
whereinthe stages are positionable so as to be close to or in contact with each other in order to perform a simultaneous movement of the stages to bring the lithographic apparatus from a first state in which the liquid is confined between a first substrate held by a first stage of the substrate stages and the projection system, to a second state in which the liquid is confined between a second substrate held by a second stage of the substrate stages and the projection system, such that during the simultaneous movement the liquid is essentially confined within the space in contact with the projection system.
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Abstract
A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
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Citations
11 Claims
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1. A lithographic apparatus comprising:
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a measuring system that measures characteristics of substrates in a first area of the apparatus; a projection system that projects a patterned radiation beam onto a substrate in a second area of the apparatus; a liquid confinement system that at least partly confines liquid in a space between the projection system and the substrate; at least two substrate stages each of which holds a substrate; and a positioning system that moves the stages between the first area and the second area, and during exposure, positions one of the stages holding a substrate in the second area on the basis of at least one measured characteristic of that substrate;
whereinthe stages are positionable so as to be close to or in contact with each other in order to perform a simultaneous movement of the stages to bring the lithographic apparatus from a first state in which the liquid is confined between a first substrate held by a first stage of the substrate stages and the projection system, to a second state in which the liquid is confined between a second substrate held by a second stage of the substrate stages and the projection system, such that during the simultaneous movement the liquid is essentially confined within the space in contact with the projection system. - View Dependent Claims (2, 3, 4, 5)
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6. A manufacturing method of manufacturing a lithographic apparatus, the method comprising:
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providing a measuring system that measures characteristics of substrates in a first area of the apparatus; providing a projection system that projects a patterned radiation beam onto a substrate in a second area of the apparatus; providing a liquid confinement system that at least partly confines liquid in a space between the projection system and the substrate; providing at least two substrate stages each of which holds a substrate, the substrate stages being positionable so as to be close to or in contact with each other in order to perform a simultaneous movement of the stages to bring the lithographic apparatus from a first state in which the liquid is confined between a first substrate held by a first stage of the substrate stages and the projection system, to a second state in which the liquid is confined between a second substrate held by a second stage of the substrate stages and the projection system, such that during the simultaneous movement the liquid is essentially confined within the space in contact with the projection system; and providing a positioning system that moves the stages between the first area and the second area, and during exposure, positions one of the stages holding a substrate in the second area on the basis of at least one measured characteristic of that substrate.
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7. An exposure method, comprising:
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moving at least two substrate stages each of which holds a substrate between a first area where measurement of characteristics of substrates is performed and a second area where a patterned radiation beam is projected from a projection system onto a substrate, and during exposure, positioning one of the stages holding a substrate in the second area on the basis of at least one measured characteristic of that substrate; and positioning the stages so as to be close to or in contact with each other in order to perform a simultaneous movement of the stages to bring the lithographic apparatus from a first state in which the liquid is confined between a first substrate held by a first stage of the substrate stages and the projection system, to a second state in which the liquid is confined between a second substrate held by a second stage of the substrate stages and the projection system, such that the liquid is essentially confined within the space in contact with the projection system. - View Dependent Claims (8, 9, 10, 11)
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Specification