Field-effect transistor and method for manufacturing a field-effect transistor
First Claim
1. A semiconductor component, comprising:
- a substrate having a surface;
a trench formed in the surface and having a trench bottom and a trench edge;
a source area implemented at the trench edge;
a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer;
a gate contact contacting the gate electrode;
a drain electrode at a side of the substrate;
an additional electrode implemented between the gate electrode and the trench bottom and electrically insulated from the substrate; and
an electrical connection with a predetermined ohmic resistance value coupled between the additional electrode and the gate electrode,wherein the predetermined ohmic resistance value is selected so that an equalization of potential between the gate electrode and the additional electrode takes place after a time delay, andwherein the gate contact and the electrical connection are provided on opposite sides of the trench.
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Accused Products
Abstract
A field-effect transistor and a method for manufacturing a field-effect transistor is disclosed. One embodiment includes a substrate having a surface along which a trench is implemented, wherein the trench has a trench bottom and a trench edge. A source area is implemented at the trench edge and a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer. The field-effect transistor includes a drain electrode at a side of the substrate facing away from the surface. An additional electrode is implemented between the gate electrode and the trench bottom and electrically insulated from the substrate and an electrical connection between the additional electrode and the gate electrode, wherein the electrical connection has a predetermined ohmic resistance value.
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Citations
20 Claims
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1. A semiconductor component, comprising:
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a substrate having a surface; a trench formed in the surface and having a trench bottom and a trench edge; a source area implemented at the trench edge; a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer; a gate contact contacting the gate electrode; a drain electrode at a side of the substrate; an additional electrode implemented between the gate electrode and the trench bottom and electrically insulated from the substrate; and an electrical connection with a predetermined ohmic resistance value coupled between the additional electrode and the gate electrode, wherein the predetermined ohmic resistance value is selected so that an equalization of potential between the gate electrode and the additional electrode takes place after a time delay, and wherein the gate contact and the electrical connection are provided on opposite sides of the trench. - View Dependent Claims (2)
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3. A field-effect transistor, comprising:
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a substrate comprising a surface along which a trench is formed, wherein the trench comprises a trench bottom and a trench edge; a source area implemented at the trench edge; a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer; a gate contact contacting the gate electrode; a drain electrode at a side of the substrate facing away from the surface; an additional electrode which is implemented between the gate electrode and the trench bottom and is electrically insulated from the substrate; and an electrical connection between the additional electrode and the gate electrode, wherein the electrical connection comprises a predetermined ohmic resistance value, and wherein the predetermined ohmic resistance value is selected so that an equalization of potential between the gate electrode and the additional electrode takes place after a time delay, and wherein the gate contact and the electrical connection are provided on opposite sides of the trench. - View Dependent Claims (4, 5, 6, 7, 8, 9, 10)
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11. A semiconductor structure comprising a recess formed in a surface area of a semiconductor substrate, comprising a bottom and an edge, comprising:
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a first means to provide a first electrical contact, wherein the first means is implemented at the edge; a second means to provide an electrical control contact, wherein the second means is at least partially implemented in the trench and separated from the semiconductor substrate by an insulation layer; a third means which is implemented between the second means and the bottom and electrically insulated from the semiconductor substrate; a fourth means between the third means and the second means to decrease a switch-on resistance of the field-effect transistor, wherein the fourth means comprises a predetermined ohmic resistance value; and a fifth means to provide an external contact for the second means and connected to the second means, wherein the predetermined ohmic resistance value is selected so that an equalization of potential between the gate electrode and the additional electrode takes place after a time delay, and wherein the fourth means and the fifth means are provided on opposite sides of the trench. - View Dependent Claims (12, 13, 14)
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15. A method for manufacturing a field-effect transistor, comprising:
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providing a substrate with a surface, forming a trench along the surface of the substrate, wherein the trench comprises a trench bottom and a trench edge; forming a source area; forming a gate electrode which is at least partially implemented within the trench; forming a gate contact contacting the gate electrode; forming a drain electrode at a side of the substrate facing away from the surface; forming an additional electrode between the gate electrode and the trench bottom; forming an insulation layer between the gate electrode and the substrate between the substrate and the gate electrode and between the substrate and the additional electrode; and forming an electrical connection between the additional electrode and the gate electrode, wherein forming an electrical connection between the additional electrode and the gate electrode comprises setting an ohmic resistance value of the electrical connection such that an equalization of potential between the gate electrode and the additional electrode takes place after a time delay, and wherein the gate contact and the electrical connection are formed on opposite sides of the trench. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification