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Method for making a graded barrier coating

  • US 8,034,419 B2
  • Filed: 12/01/2008
  • Issued: 10/11/2011
  • Est. Priority Date: 06/30/2004
  • Status: Active Grant
First Claim
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1. A method of forming a barrier coating, the method comprising:

  • providing a device having a surface; and

    depositing on said surface a graded-composition barrier coating comprising;

    a first zone defined by a first thickness comprising a first material and a second material wherein a composition of said first zone varies substantially continuously across said first thickness; and

    a second zone defined by a second thickness which is substantially free of any of said first material; and

    ,wherein said coating is deposited using a method selected from the group consisting of;

    sputtering, reactive sputtering, evaporation, plasma-enhanced chemical vapor deposition, reactive ion etching plasma-enhanced chemical vapor deposition, radio-frequency plasma-enhanced chemical-vapor deposition, expanding thermal plasma chemical-vapor deposition, electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition, inductively-coupled plasma-enhanced chemical-vapor deposition, and combinations thereof.

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