Method for making a graded barrier coating
First Claim
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1. A method of forming a barrier coating, the method comprising:
- providing a device having a surface; and
depositing on said surface a graded-composition barrier coating comprising;
a first zone defined by a first thickness comprising a first material and a second material wherein a composition of said first zone varies substantially continuously across said first thickness; and
a second zone defined by a second thickness which is substantially free of any of said first material; and
,wherein said coating is deposited using a method selected from the group consisting of;
sputtering, reactive sputtering, evaporation, plasma-enhanced chemical vapor deposition, reactive ion etching plasma-enhanced chemical vapor deposition, radio-frequency plasma-enhanced chemical-vapor deposition, expanding thermal plasma chemical-vapor deposition, electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition, inductively-coupled plasma-enhanced chemical-vapor deposition, and combinations thereof.
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Abstract
Disclosed is a method relating to graded-composition barrier coatings comprising first and second materials in first and second zones. The compositions of one or both zones vary substantially continuously across a thickness of the zone in order to achieve improved properties such as barrier, flexibility, adhesion, optics, thickness, and tact time. The graded-composition barrier coatings find utility in preventing exposure of devices such as organic electro-luminescent devices (OLEDs) to reactive species found in the environment.
70 Citations
31 Claims
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1. A method of forming a barrier coating, the method comprising:
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providing a device having a surface; and depositing on said surface a graded-composition barrier coating comprising; a first zone defined by a first thickness comprising a first material and a second material wherein a composition of said first zone varies substantially continuously across said first thickness; and a second zone defined by a second thickness which is substantially free of any of said first material; and
,wherein said coating is deposited using a method selected from the group consisting of;
sputtering, reactive sputtering, evaporation, plasma-enhanced chemical vapor deposition, reactive ion etching plasma-enhanced chemical vapor deposition, radio-frequency plasma-enhanced chemical-vapor deposition, expanding thermal plasma chemical-vapor deposition, electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition, inductively-coupled plasma-enhanced chemical-vapor deposition, and combinations thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method of framing a barrier coating, the method comprising:
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providing a substrate; providing an electronic device disposed on said substrate; and depositing on said electronic device via plasma-enhanced chemical-vapor deposition a graded-composition barrier coating which is substantially transparent to visible light, wherein said coating comprises; a first zone defined by a first thickness in which a composition of an inorganic material and a composition of an organic material each vary substantially continuously across said first thickness and wherein said first thickness is between approximately 5 nm and approximately 1000 nm; and a second zone defined by a second thickness which is substantially free of any organic material. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31)
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Specification