Immersion exposure apparatus and device manufacturing method

• US 8,035,796 B2
• Filed: 06/04/2008
• Issued: 10/11/2011
• Est. Priority Date: 06/27/2007
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Iwasaki, Yuichi
• Primary Examiner(s): Kim; Peter B
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US12/133,206
• Publication Number:
  US 20090002649A1
• Time in Patent Office: 1,224 Days
• Field of Search: 355/30, 355/53, 355/55, 355 72- 74, 355/77, 430/30, 430/311, 430/312, 430/328, 430/330, 250/492.1, 250/492.2, 250/492.22, 250/548
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.

Claims

1. An immersion exposure apparatus for exposing a substrate through a liquid comprising:

an illumination optical system configured to illuminate an original with exposure light from an exposure light source;

a projection optical system configured to project a pattern of the original onto the substrate;

a chuck configured to hold the substrate;

a liquid support plate configured to support the liquid together with the substrate held by the chuck, a surface of the liquid support plate including a surface of a metal oxide;

a movable stage including the chuck and the liquid support plate; and

a liquid repellency recovery unit configured to recover a liquid repellency of the surface of the metal oxide with respect to the liquid,

wherein a metal oxide film is formed on a surface of the liquid support plate and a surface of the metal oxide is a surface of the metal oxide film,

wherein the liquid support plate includes a transparent base material that transmits an irradiating light and the metal oxide film is formed on a surface of the transparent base material; and

wherein the liquid repellency recovery unit illuminates the metal oxide film with the irradiating light through the transparent base material.

2. The immersion exposure apparatus according to claim 1, wherein the liquid repellency recovery unit includes a blower for blowing air to a surface of the metal oxide.

3. The immersion exposure apparatus according to claim 1, wherein the liquid repellency recovery unit includes a heater for heating the metal oxide.

4. The immersion exposure apparatus according to claim 1, wherein the metal oxide includes at least one of TiO₂, ZnO, Cr₂O₃, HfO₂, and WO₃.

5. The immersion exposure apparatus according to claim 1, further comprising:

an exposure station on which the stage is provided in order to expose the substrate to light; and

a measurement station on which the stage is provided in order to measure positions of shot regions of the substrate;

wherein the liquid repellency recovery unit is provided on the measurement station or between the measurement station and the exposure station.