Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
First Claim
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1. A projection exposure apparatus in which a substrate is exposed with an exposure beam via a liquid on the substrate, the projection exposure apparatus comprising:
- a liquid supply and recovery system which supplies the liquid from a supply opening via a liquid supply tube onto the substrate during exposure, and recovers the liquid on the substrate from a recovery opening to a liquid recovery tube during the exposure;
a member having a surface which comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening; and
a scale adhesion prevention device provided on the liquid supply tube, which prevents scale from adhering to the surface of the member by using an electrical force.
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Abstract
A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.
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Citations
27 Claims
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1. A projection exposure apparatus in which a substrate is exposed with an exposure beam via a liquid on the substrate, the projection exposure apparatus comprising:
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a liquid supply and recovery system which supplies the liquid from a supply opening via a liquid supply tube onto the substrate during exposure, and recovers the liquid on the substrate from a recovery opening to a liquid recovery tube during the exposure; a member having a surface which comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening; and a scale adhesion prevention device provided on the liquid supply tube, which prevents scale from adhering to the surface of the member by using an electrical force. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A projection exposure apparatus in which a substrate is exposed with exposure light via a liquid, the projection exposure apparatus comprising:
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a liquid supply system which supplies the liquid from a supply opening via a liquid supply tube onto the substrate during exposure; a liquid recovery system which recovers the liquid on the substrate from a recovery opening to a liquid recovery tube during the exposure; a member having a surface which comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening; and an adhesion prevention device which prevents an adhesion of impurities to the surface of the member by using an electrical force. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A projection exposure apparatus in which a substrate is exposed with exposure light via a liquid on the substrate, the projection exposure apparatus comprising:
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a supply opening via which the liquid is supplied to a space on the substrate during exposure; a recovery opening via which the liquid is recovered from the space during the exposure; a member having a surface which comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening; and an adhesion prevention device which prevents an adhesion of impurities to the surface of the member using an electrical force. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21)
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22. A method used in a liquid immersion exposure apparatus in which a substrate is exposed with exposure light via a liquid on the substrate, the method comprising:
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supplying the liquid via a supply opening to a space on the substrate during exposure; recovering the liquid via a recovery opening from the space during the exposure; and preventing impurities in the liquid from adhering to a surface of a member of the exposure apparatus by using an electrical force, wherein the surface of the member comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening. - View Dependent Claims (23, 24, 25, 26, 27)
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Specification