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Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method

  • US 8,035,797 B2
  • Filed: 03/23/2006
  • Issued: 10/11/2011
  • Est. Priority Date: 09/26/2003
  • Status: Active Grant
First Claim
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1. A projection exposure apparatus in which a substrate is exposed with an exposure beam via a liquid on the substrate, the projection exposure apparatus comprising:

  • a liquid supply and recovery system which supplies the liquid from a supply opening via a liquid supply tube onto the substrate during exposure, and recovers the liquid on the substrate from a recovery opening to a liquid recovery tube during the exposure;

    a member having a surface which comes into contact with the liquid that has been supplied from the supply opening and has not yet been recovered from the recovery opening; and

    a scale adhesion prevention device provided on the liquid supply tube, which prevents scale from adhering to the surface of the member by using an electrical force.

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