Percutaneous spinal implants and methods

• US 8,038,698 B2
• Filed: 10/19/2005
• Issued: 10/18/2011
• Est. Priority Date: 02/17/2005
• Status: Active Grant

• Current Assignee: Kyphon SARL (Medtronic Plc)
• Original Assignee: Kphon SARL
• Inventors: Edidin, Avram Allan, Malandain, Hugues F., Vandervelde, Robert Alexander
• Primary Examiner(s): Robert; Eduardo C
• Assistant Examiner(s): CARTER, TARA ROSE E
• Application Number:
  US11/252,879
• Publication Number:
  US 20060184247A1
• Time in Patent Office: 2,190 Days
• Field of Search: 606/246, 606/248, 606/249, 606/279, 606/86.A, 606/86.B, 606/90, 606/105, 623/16.11, 623 1711- 1716
• US Class Current: 606/246
• CPC Class Codes: A61B 17/025 Joint distractors
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 2017/00557 inflatable A61B2017/22051 takes precedence
• CPC Class Codes: A61B 2017/0256 for the spine

Abstract

An apparatus includes an elongate member having a proximal portion configured to be deformed from a first configuration to a second configuration. The elongate member has a distal portion configured to be deformed from a first configuration to a second configuration. A non-expanding central portion is positioned between the proximal portion and the distal portion. The non-expanding central portion is configured to engage adjacent spinous processes.

Claims

1. A spinal implant apparatus, comprising:

a proximal portion configured to be deformed from a first configuration to a second configuration to cause deformation of the proximal portion;

a distal portion configured to be deformed from a first configuration to a second configuration to cause deformation of the distal portion;

a non-expanding central portion disposed between the proximal portion and the distal portion, the non-expanding central portion configured to engage adjacent spinous processes;

wherein the distal portion comprises a distal section disposed distally from the central portion and a deformable intermediate section disposed between the distal section and the central portion;

wherein the distal portion, the central portion, and the proximal portion are disposed sequentially along a longitudinal axis such that the longitudinal axis extends therethrough when the distal portion and the proximal portion are in their first configurations;

wherein the distal section is disposed along the longitudinal axis such that the longitudinal axis extends therethrough when the distal portion is in both its first and second configurations.

2. The apparatus of claim 1, wherein the proximal portion, the distal portion and the central portion are monolithically formed.

3. The apparatus of claim 1, wherein the proximal portion is configured to deform to its second configuration before the distal portion deforms to its second configuration.

4. The apparatus of claim 1, wherein the proximal portion includes a first surface and a second surface that are spaced apart in the first configuration and matingly engage each other in the second configuration, the first surface and the second surface configured to restrict further deformation of the proximal portion once matingly engaged.

5. The apparatus of claim 1 wherein the implant is configured to be inserted between adjacent spinous processes percutaneously.

6. The apparatus of claim 1 wherein the proximal portion has a plurality of projections configured to extend outwardly in the second configuration.

7. The apparatus of claim 1 wherein the distal portion has a plurality of projections configured to extend outwardly in the second configuration.

8. The apparatus of claim 1 wherein the proximal portion and the distal portion each have a plurality of projections configured to extend outwardly in the second configuration, at least one projection from the plurality of projections being asymmetrical about an axis of the at least one projection.

9. The apparatus of claim 1, wherein the proximal portion and the distal portion deform from the first configuration to the second configuration substantially without distraction of the adjacent spinous processes.

10. The apparatus of claim 1, wherein the proximal portion and the distal portion are configured to deform from the first configuration to the second configuration under an axial load.

11. A spinal implant apparatus, comprising:

a proximal portion configured to be deformed from a first configuration to a second configuration to cause deformation of the proximal portion;

a distal portion configured to be deformed from a first configuration to a second configuration to cause deformation of the distal portion;

a non-expanding central portion disposed between the proximal portion and the distal portion, the non-expanding central portion configured to engage adjacent spinous processes;

wherein the distal portion comprises a distal section disposed distally from the central portion and a deformable intermediate section disposed between the distal section and the central portion;

wherein the distal portion, the central portion, and the proximal portion are disposed sequentially along a longitudinal axis when the distal portion and the proximal portion are in their first configurations;

wherein the distal section is disposed along the longitudinal axis when the distal portion is in both its first and second configurations;

wherein the proximal portion, the distal portion and the central portion together form a tube having a substantially constant inner diameter.