Scattering bar OPC application method for sub-half wavelength lithography patterning
First Claim
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1. A method of forming a mask comprising features to be imaged and optical proximity correction features, said method comprising the steps of:
- forming a first assist feature adjacent a feature to be imaged;
forming a second assist feature non-parallel to the first assist feature and also adjacent to the feature to be imaged;
extending one or both of the first and second assist features until they intersect; and
forming a corner assist feature at the intersection of the first assist and second assist features and pulling back both the first and second assist features until they both contact the corner assist feature but extend no further.
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Abstract
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding—the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
32 Citations
24 Claims
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1. A method of forming a mask comprising features to be imaged and optical proximity correction features, said method comprising the steps of:
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forming a first assist feature adjacent a feature to be imaged; forming a second assist feature non-parallel to the first assist feature and also adjacent to the feature to be imaged; extending one or both of the first and second assist features until they intersect; and forming a corner assist feature at the intersection of the first assist and second assist features and pulling back both the first and second assist features until they both contact the corner assist feature but extend no further. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of forming a mask comprising features to be imaged and optical proximity correction features;
- said method comprising the steps of
forming a plurality of first assist features respectively adjacent to a plurality of features to be imaged, each of which extends in a first direction; forming a plurality of second assist features respectively adjacent to the plurality of features to be imaged, each of which extends in a second direction, said first direction and said second direction being non-parallel to one another; extending one or both of the first and second assist features until they form a respective plurality of intersections; and forming a plurality of corner assist features at the plurality of intersections, respectively, and pulling back both the respective first and second assist features until they both contact the corner assist features but extend no further. - View Dependent Claims (8, 9, 10, 11, 12)
- said method comprising the steps of
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13. A program product, comprising executable code transportable by at least one machine readable medium, wherein execution of the code by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for forming a mask for optically transferring a pattern formed in said mask onto a substrate, said steps comprising:
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forming a first assist feature adjacent a feature to be imaged; forming a second assist feature non-parallel to the first assist feature and also adjacent to the feature to be imaged; extending one or both of the first and second assist features until they intersect; and forming a corner assist feature at the intersection of the first assist and second assist features and pulling back both the first and second assist features until they both contact the corner assist feature but extend no further. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A program product, comprising executable code transportable by at least one machine readable medium, wherein execution of the code by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for forming a mask for optically transferring a pattern formed in said mask onto a substrate, said steps comprising:
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forming a plurality of first assist features respectively adjacent to a plurality of features to be imaged, each of which extends in a first direction; forming a plurality of second assist features respectively adjacent to the plurality of features to be imaged, each of which extends in a second direction, said first direction and said second direction being non-parallel to one another; extending one or both of the first and second assist features until they form a respective plurality of intersections; and forming a plurality of corner assist features at the plurality of intersections, respectively, and pulling back both the respective first and second assist features until they both contact the corner assist features but extend no further. - View Dependent Claims (20, 21, 22, 23, 24)
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Specification
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Current AssigneeASML Netherlands BV (ASML Holding NV)
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Original AssigneeASML Masktools B.V. (ASML Holding NV)
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InventorsLaidig, Thomas, Chen, Jang Fung, Van Den Broeke, Douglas, Wampler, Kurt E.
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Primary Examiner(s)YOUNG, CHRISTOPHER G
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Application NumberUS13/032,590Publication NumberTime in Patent Office238 DaysField of Search430/5, 430/30US Class Current430/5CPC Class CodesG03F 1/36 Masks having proximity corr...
