Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
First Claim
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1. A substrate processing method comprising:
- holding a substrate on a substrate holder;
exposing the substrate held on the substrate holder by forming a liquid immersion area of a first liquid on the substrate and radiating an exposure light beam onto the substrate through the first liquid;
immersing the substrate in a second liquid, before the substrate is loaded on the substrate holder and before exposing the substrate; and
adjusting a temperature of the substrate to be a predetermined temperature after a process of removing the second liquid from the substrate and before the substrate is loaded on the substrate holder, whereinthe predetermined temperature is based on at least one of the temperature of the substrate holder and a temperature of the first liquid.
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Abstract
A substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.
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Citations
28 Claims
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1. A substrate processing method comprising:
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holding a substrate on a substrate holder; exposing the substrate held on the substrate holder by forming a liquid immersion area of a first liquid on the substrate and radiating an exposure light beam onto the substrate through the first liquid; immersing the substrate in a second liquid, before the substrate is loaded on the substrate holder and before exposing the substrate; and adjusting a temperature of the substrate to be a predetermined temperature after a process of removing the second liquid from the substrate and before the substrate is loaded on the substrate holder, wherein the predetermined temperature is based on at least one of the temperature of the substrate holder and a temperature of the first liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An exposure apparatus which exposes a substrate by forming a liquid immersion area of a first liquid on the substrate and radiating an exposure light beam onto the substrate through the first liquid, the exposure apparatus comprising:
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a substrate holder on which the substrate is held, the substrate being loaded on the substrate holder after immersing the substrate in a second liquid and after a process of removing the second liquid from the substrate; a projection system by which the exposure light beam is radiated onto the substrate held by the substrate holder through the first liquid in the liquid immersion area formed on the substrate; and a temperature adjustment device which adjusts a temperature of the substrate to be a predetermined temperature after the process of removing the second liquid from the substrate and before loading the substrate on the substrate holder, wherein the predetermined temperature is based on at least one of a temperature of the substrate holder and a temperature of the first liquid. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28)
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Specification