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Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid

  • US 8,040,489 B2
  • Filed: 10/25/2005
  • Issued: 10/18/2011
  • Est. Priority Date: 10/26/2004
  • Status: Active Grant
First Claim
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1. A substrate processing method comprising:

  • holding a substrate on a substrate holder;

    exposing the substrate held on the substrate holder by forming a liquid immersion area of a first liquid on the substrate and radiating an exposure light beam onto the substrate through the first liquid;

    immersing the substrate in a second liquid, before the substrate is loaded on the substrate holder and before exposing the substrate; and

    adjusting a temperature of the substrate to be a predetermined temperature after a process of removing the second liquid from the substrate and before the substrate is loaded on the substrate holder, whereinthe predetermined temperature is based on at least one of the temperature of the substrate holder and a temperature of the first liquid.

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