Position sensor system for substrate transfer robot

• US 8,041,450 B2
• Filed: 10/04/2007
• Issued: 10/18/2011
• Est. Priority Date: 10/04/2007
• Status: Active Grant

• Current Assignee: ASM Japan K.K. (ASM International NV)
• Original Assignee: ASM Japan K.K. (ASM International NV)
• Inventors: Takizawa, Masahiro, Suwada, Masaei
• Primary Examiner(s): Black; Thomas
• Assistant Examiner(s): LOUIE, WAE LENNY
• Application Number:
  US11/867,525
• Publication Number:
  US 20090093906A1
• Time in Patent Office: 1,475 Days
• Field of Search: 700/214, 700/258, 700/245, 901/30
• US Class Current: 700/214
• CPC Class Codes: H01L 21/67265 of substrates stored in a container, a magazine, a carrier, a boat or the like
• CPC Class Codes: H01L 21/68707 the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Abstract

A substrate processing apparatus comprises a substrate handling chamber, a pair of position sensors, and a substrate transfer robot. Each of the sensors comprises an emitter configured to emit a beam of light, and a receiver configured to receive the light beam. The substrate transfer robot comprises an end effector and a robot actuator. The end effector is configured to hold a substrate such that the substrate has a same expected position with respect to the end effector every time the substrate is held. The robot actuator is configured to move the end effector within the handling chamber to transfer substrates among a plurality of substrate stations. An edge of a substrate held in the expected position by the end effector can partially block a light beam of one of the position sensors, while another end of the end effector partially blocks a light beam of the other position sensor.

Claims

1. A semiconductor substrate processing apparatus, comprising:

a substrate handling chamber;

a first pair of position sensors each comprising;

a light beam emitter configured to emit a beam of light; and

a receiver configured to receive the light beam; and

a substrate transfer robot within the handling chamber, the robot comprising;

an elongated end effector having a distal end and a proximal end, the end effector configured to pick up and hold a semiconductor substrate at the distal end such that the substrate has a same expected position with respect to the end effector every time the substrate is picked up and held by the end effector; and

a robot actuator configured to move the end effector within the handling chamber to transfer substrates among a plurality of substrate stations;

wherein the end effector has a length such that it is possible for an edge of a substrate held in the expected position by the end effector to partially block a light beam emitted from the emitter of one of the position sensors, while the proximal end of the end effector partially blocks a light beam emitted from the emitter of the other position sensor.

2. The apparatus of claim 1, wherein the light beam emitter of each sensor is positioned below the end effector and is configured to upwardly emit its beam of light, the receiver of each sensor being above the emitter of the sensor and the end effector.

3. The apparatus of claim 1, further comprising a pair of ports each between the substrate handling chamber and one of two adjacent chambers, each adjacent chamber comprising one of a processing chamber and a load lock chamber, wherein each of the sensors is positioned by one of the ports, each port being sized to allow the end effector to pass through the port while the end effector is holding a substrate in the expected position.

4. The apparatus of claim 1, further comprising:

a first pair of processing chambers each adjacent to the substrate handling chamber;

a first pair of processing chamber ports each between the handling chamber and one of the processing chambers of the first pair of processing chambers, wherein each sensor of said first pair of sensors is positioned by one of the processing chamber ports of the first pair of processing chamber ports;

a second pair of processing chambers each adjacent to the substrate handling chamber;

a second pair of processing chamber ports each between the handling chamber and one of the processing chambers of the second pair of processing chambers; and

a second pair of position sensors within the handling chamber, each sensor of the second pair of sensors comprising;

a light beam emitter configured to emit a beam of light; and

a receiver configured to receive the light beam;

wherein the sensors of the second pair of sensors are positioned so that it is possible for an edge of a substrate held in the expected position by the end effector to partially block a light beam emitted from the emitter of one of the sensors of the second pair of sensors, while the proximal end of the end effector partially blocks a light beam emitted from the emitter of the other sensor of the second pair of sensors, each of the sensors of the second pair of sensors being positioned by one of the processing chamber ports of the second pair of processing chamber ports, each of the processing chamber ports of the first and second pairs of processing chamber ports being sized to allow the end effector to pass through the processing chamber port while the end effector is holding a substrate in the expected position.

5. The apparatus of claim 1, further comprising a control system programmed to determine, for each of the sensors, an amount of light received by the receiver of the sensor from the emitter of the sensor.

6. The apparatus of claim 1, further comprising a control system programmed to:

(a) instruct the end effector to hold a substrate in the expected position;

(b) instruct the robot to move the end effector to a target position while holding the substrate in the expected position, wherein the target position of the end effector is such that the distal end of the end effector is near a first sensor of the pair of sensors and the proximal end of the end effector is near a second sensor of the pair of sensors;

(c) determine an amount of light received by the receiver of the first sensor from the emitter of the first sensor when the control system has instructed the end effector to hold a substrate in the expected position and has instructed the robot to move the end effector to the target position while holding the substrate in the expected position;

(d) implement a first end effector action if said received amount of light is equal to an amount of light emitted by the emitter of the first sensor;

(e) implement a second end effector action if said received amount of light is less than the amount of light emitted by the emitter of the first sensor but greater than a predetermined threshold; and

(f) implement a third end effector action if said received amount of light is less than said threshold;

wherein the first, second, and third actions are different.

7. The apparatus of claim 6, wherein the first action is based on a conclusion that the end effector is not holding a substrate, the second action is based on a conclusion that the end effector is holding a substrate in the expected position, and the third action is based on a conclusion that the substrate is projecting distally beyond the expected position of the substrate.

8. The apparatus of claim 1, further comprising a control system programmed to:

(a) instruct the end effector to hold a substrate in the expected position;

(b) instruct the robot to move the end effector to a target position while holding the substrate in the expected position, wherein the target position of the end effector is such that the distal end of the end effector is near a first sensor of the pair of sensors and the proximal end of the end effector is near a second sensor of the pair of sensors;

(c) determine an amount of light received by the receiver of the second sensor from the emitter of the second sensor when the control system has instructed the end effector to hold a substrate in the expected position and has instructed the robot to move the end effector to the target position while holding the substrate in the expected position;

(d) implement a first end effector action if said received amount of light is equal to an amount of light emitted by the emitter of the second sensor;

(e) implement a second end effector action if said received amount of light is less than the amount of light emitted by the emitter of the second sensor but greater than a predetermined threshold; and

(f) implement a third end effector action if said received amount of light is less than said threshold;

wherein the first, second, and third actions are different.

9. The apparatus of claim 8, wherein the first action is based on a conclusion that the end effector is not in the target position, the second action is based on a conclusion that the end effector is in the target position but is not holding a substrate, and the third action is based on a conclusion that the end effector is in the target position and is holding a substrate in the expected position.

10. The apparatus of claim 1, further comprising:

a substrate input/output chamber adjacent to the handling chamber;

an input/output port between the handling chamber and the input/output chamber, the input/output port being sized to allow the end effector to pass through the input/output port while the end effector is holding a substrate in the expected position;

an input/output position sensor positioned on a side of the handling chamber opposite the input/output port, the input/output sensor comprising;

a light beam emitter configured to emit a beam of light; and

a receiver configured to receive the light beam; and

a control system programmed to;

(a) instruct the end effector to hold a substrate in the expected position;

(b) instruct the robot to move the end effector to a target position while holding the substrate in the expected position, wherein the target position of the end effector is such that the proximal end of the end effector is near the input/output sensor, the end effector is substantially aligned with the input/output sensor and the input/output port, and the distal end of the end effector points toward the input/output port;

(c) determine an amount of light received by the receiver of the input/output sensor from the emitter of the input/output sensor when the control system has instructed the end effector to hold a substrate in the expected position and has instructed the robot to move the end effector to the target position while holding the substrate in the expected position;

(d) implement a first end effector action if said received amount of light is equal to an amount of light emitted by the emitter of the input/output sensor;

(e) implement a second end effector action if said received amount of light is less than the amount of light emitted by the emitter of the intput/output sensor but greater than a predetermined threshold; and

(f) implement a third end effector action if said received amount of light is less than said threshold;

wherein the first, second, and third actions are different.

11. The apparatus of claim 1, wherein the end effector comprises:

a paddle configured to underlie and support a substrate, the paddle having a distal end defining the distal end of the end effector, the paddle having one or more forward clamping elements configured to clamp against an edge of a substrate held by the end effector; and

a proximal clamping member having one or more clamping elements configured to clamp against an edge of a substrate held by the end effector, the proximal clamping member being configured to move toward and away from the distal end of the end effector to clamp or unclamp a substrate between the clamping elements of the paddle and the clamping elements of the proximal clamping member, wherein said movement of the proximal clamping member with respect to the distal end of the end effector varies a position of the proximal end of the end effector with respect to the distal end of the end effector.

12. The apparatus of claim 1, further comprising a second substrate transfer robot within the substrate handling chamber, the second robot comprising:

a second elongated end effector having a distal end and a proximal end, the second end effector configured to pick up and hold a semiconductor substrate at the distal end of the second end effector such that the substrate has a same expected position with respect to the second end effector every time the substrate is picked up and held by the second end effector; and

a second robot actuator configured to move the second end effector within the handling chamber to transfer substrates among the plurality of substrate stations;

wherein the second end effector has a length such that it is possible for an edge of a substrate held by the second end effector in the expected position to partially block a light beam emitted from the emitter of one of the position sensors, while the proximal end of the second end effector partially blocks a light beam emitted from the emitter of the other position sensor.

13. The apparatus of claim 1, wherein the sensors are both positioned at an outer periphery of the handling chamber such that at least one of the sensors can detect an obstacle in a gate valve between the substrate handling chamber and an adjacent chamber.

14. A method of controlling a semiconductor substrate transfer robot, comprising:

providing a first pair of position sensors, each sensor comprising a light beam emitter and a receiver, the emitter configured to emit a beam of light, the receiver configured to receive the light beam from the emitter;

providing a substrate transfer robot within a substrate handling chamber, the robot comprising an elongated end effector and a robot actuator, the end effector having a distal end and a proximal end, the end effector configured to pick up and hold a semiconductor substrate at the distal end such that the substrate has a same expected position with respect to the end effector every time the substrate is picked up and held by the end effector, the robot actuator configured to move the end effector within the handling chamber to transfer substrates among a plurality of substrate stations, wherein the end effector has a length such that it is possible for an edge of a substrate held in the expected position by the end effector to partially block a light beam emitted from the emitter of one of the position sensors, while the proximal end of the end effector partially blocks a light beam emitted from the emitter of the other position sensors;

instructing the end effector to hold a substrate in the expected position with respect to the end effector;

instructing the robot to move the end effector to a target position while holding the substrate in the expected position with respect to the end effector, wherein the target position of the end effector is such that the distal end of the end effector is near a first sensor of the pair of sensors and the proximal end of the end effector is near a second sensor of the pair of sensors;

after said instructing steps, determining one or both of (1) an amount of light received by the receiver of the first sensor from the emitter of the first sensor, and (2) an amount of light received by the receiver of the second sensor from the emitter of the second sensor; and

controlling the robot based on said determining.

15. The method of claim 14, further comprising:

providing two chambers adjacent to the substrate handling chamber, each of the adjacent chambers comprising one of a processing chamber and a load lock chamber; and

providing a pair of ports each between the substrate handling chamber and one of the adjacent chambers, each port being sized to allow the end effector to pass through the port while the end effector is holding a substrate in the expected position;

wherein providing the pair of sensors comprises positioning each of the sensors by one of the ports.

16. The method of claim 14, further comprising:

providing a first pair of processing chambers each adjacent to the substrate handling chamber;

providing a first pair of processing chamber ports each between the handling chamber and one of the processing chambers of the first pair of processing chambers, wherein each sensor of said first pair of sensors is positioned by one of the processing chamber ports of the first pair of processing chamber ports;

providing a second pair of processing chambers each adjacent to the substrate handling chamber;

providing a second pair of processing chamber ports each between the handling chamber and one of the processing chambers of the second pair of processing chambers;

providing a second pair of position sensors within the handling chamber, each sensor of the second pair of sensors comprising;

a light beam emitter configured to emit a beam of light; and

a receiver configured to receive the light beam;

positioning the sensors of the second pair of sensors so that it is possible for an edge of a substrate held in the expected position by the end effector to partially block a light beam emitted from the emitter of one of the sensors of the second pair of sensors, while the proximal end of the end effector partially blocks a light beam emitted from the emitter of the other sensor of the second pair of sensors; and

positioning each of the sensors of the second pair of sensors by one of the processing chamber ports of the second pair of processing chamber ports,

wherein each of the processing chamber ports of the first and second pairs of processing chamber ports is sized to allow the end effector to pass through the processing chamber port while the end effector is holding a substrate in the expected position.

17. The method of claim 14, further comprising:

determining, for each of the sensors, an amount of light received by the receiver of the sensor from the emitter of the sensor.

18. The method of claim 14:

wherein said determining comprises determining an amount of light received by the receiver of the first sensor from the emitter of the first sensor when the end effector has been instructed to hold a substrate in the expected position and when the robot has been instructed to move the end effector to the target position while holding the substrate in the expected position, wherein the method further comprises;

implementing a first end effector action if said amount of light received by the receiver of the first sensor is equal to an amount of light emitted by the emitter of the first sensor;

implementing a second end effector action if said amount of light received by the receiver of the first sensor is less than the amount of light emitted by the emitter of the first sensor but greater than a predetermined threshold; and

implementing a third end effector action if said amount of light received by the receiver of the first sensor is less than said threshold;

wherein the first, second, and third actions are different.

19. The method of claim 18, wherein the first action is based on a conclusion that the end effector is not holding a substrate, the second action is based on a conclusion that the end effector is holding a substrate in the expected position, and the third action is based on a conclusion that the substrate is projecting distally beyond the expected position of the substrate.

20. The method of claim 18:

wherein said determining comprises determining an amount of light received by the receiver of the second sensor from the emitter of the second sensor when the end effector has been instructed to hold a substrate in the expected position and when the robot has been instructed to move the end effector to the target position while holding the substrate in the expected position, wherein the method further comprises;

implementing a first end effector action if said amount of light received by the receiver of the second sensor is equal to an amount of light emitted by the emitter of the second sensor;

implementing a second end effector action if said amount of light received by the receiver of the second sensor is less than the amount of light emitted by the emitter of the second sensor but greater than a predetermined threshold; and

implementing a third end effector action if said amount of light received by the receiver of the second sensor is less than said threshold;

wherein the first, second, and third actions are different.

21. The method of claim 20, wherein the first action is based on a conclusion that the end effector is not in the target position, the second action is based on a conclusion that the end effector is in the target position but is not holding a substrate, and the third action is based on a conclusion that the end effector is in the target position and is holding a substrate in the expected position.

22. The method of claim 14, further comprising:

providing a substrate input/output chamber adjacent to the handling chamber;

providing an input/output port between the handling chamber and the input/output chamber, the input/output port being sized to allow the end effector to pass through the input/output port while the end effector is holding a substrate in the expected position;

providing an input/output position sensor positioned on a side of the handling chamber opposite the input/output port, the input/output sensor comprising a light beam emitter and a receiver, the emitter configured to emit a beam of light, the receiver configured to receive the light beam;

instructing the end effector to hold a substrate in the expected position;

instructing the robot to move the end effector to a second target position while holding the substrate in the expected position, wherein the second target position of the end effector is such that the proximal end of the end effector is near the input/output sensor, the end effector is substantially aligned with the input/output sensor and the input/output port, and the distal end of the end effector points toward the input/output port;

determining an amount of light received by the receiver of the input/output sensor from the emitter of the input/output sensor when the end effector has been instructed to hold a substrate in the expected position and when the robot has been instructed to move the end effector to the second target position while holding the substrate in the expected position;

implementing a first end effector action if said amount of light received by the receiver of the input/output sensor is equal to an amount of light emitted by the emitter of the input/output sensor;

implementing a second end effector action if said amount of light received by the receiver of the input/output sensor is less than the amount of light emitted by the emitter of the input/output sensor but greater than a predetermined threshold; and

implementing a third end effector action if said amount of light received by the receiver of the input/output sensor is less than said threshold;

wherein the first, second, and third actions are different.

23. The method of claim 14, wherein providing the end effector comprises:

providing a paddle configured to underlie and support a substrate, the paddle having a distal end defining the distal end of the end effector, the paddle having one or more forward clamping elements configured to clamp against an edge of a substrate held by the end effector; and

providing a proximal clamping member having one or more clamping elements configured to clamp against an edge of a substrate held by the end effector, the proximal clamping member being configured to move toward and away from the distal end of the end effector to clamp or unclamp a substrate between the clamping elements of the paddle and the clamping elements of the proximal clamping member, wherein said movement of the proximal clamping member with respect to the distal end of the end effector varies a position of the proximal end of the end effector with respect to the distal end of the end effector.

24. The method of claim 14, further comprising providing a second substrate transfer robot within the substrate handling chamber, comprising:

providing a second elongated end effector having a distal end and a proximal end, the second end effector configured to pick up and hold a semiconductor substrate at the distal end of the second end effector such that the substrate has the same expected position with respect to the second end effector every time the substrate is picked up and held by the second end effector; and

providing a second robot actuator configured to move the second end effector within the chamber to transfer substrates among the plurality of substrate stations;

wherein the second end effector has a length such that it is possible for an edge of a substrate held by the second end effector in the expected position to partially block a light beam emitted from the emitter of one of the position sensors, while the proximal end of the second end effector partially blocks a light beam emitted from the emitter of the other position sensor.

25. A semiconductor processing apparatus, comprising:

a substrate handling chamber;

a second substrate chamber adjacent to the handling chamber;

a port between the handling chamber and the second chamber;

an end effector inside the handling chamber, the end effector comprising;

a paddle having a distal end defining a distal end of the end effector, the paddle having one or more clamping elements adapted to clamp against an edge of a substrate supported by the paddle; and

a proximal clamping member having one or more proximal clamping elements adapted to clamp against an edge of a substrate supported by the paddle, the proximal clamping member adapted to move toward and away from the distal end of the paddle to clamp and unclamp a substrate between the clamping elements of the paddle and the clamping elements of the proximal clamping member, the proximal clamping member having a proximally extending structure that defines a proximal end of the end effector;

a robot actuator configured to move the end effector within the handling chamber to transfer substrates among a plurality of substrate stations;

a position sensor comprising;

a light beam emitter configured to emit a beam of light; and

a receiver configured to receive the light beam; and

a control system programmed to;

(a) instruct the robot actuator to move the end effector to a target position in which the end effector is oriented along a line extending from the sensor to the port, and in which the distal end of the paddle points toward the port; and

(b) determine an amount of light received by the receiver from the emitter.

26. The semiconductor processing apparatus of claim 25, wherein said movement of the proximal clamping member with respect to the distal end of the end effector varies a position of the proximal end of the end effector with respect to the distal end of the end effector.