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Lithographic apparatus and device manufacturing method

  • US 8,045,137 B2
  • Filed: 05/14/2008
  • Issued: 10/25/2011
  • Est. Priority Date: 12/07/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • a moveable substrate table constructed to hold a substrate to be exposed;

    a projection system configured to project a patterned radiation beam onto a target portion on a side of the substrate to be exposed;

    a liquid supply system configured to at least partly fill a region between the substrate and the projection system with a liquid; and

    a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with the moveable substrate table in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid for all positions of the moveable substrate table relative to the liquid confinement structure during exposure of the substrate.

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