Lithographic apparatus and device manufacturing method

• US 8,045,137 B2
• Filed: 05/14/2008
• Issued: 10/25/2011
• Est. Priority Date: 12/07/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Stavenga, Marco Koert, Verhagen, Martinus Cornelis Maria, Jansen, Hans, Verspay, Jacobus Johannus Leonardus Hendricus
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US12/153,116
• Publication Number:
  US 20080291407A1
• Time in Patent Office: 1,259 Days
• Field of Search: 355/30, 355/53, 355 72- 74
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Abstract

A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.

Claims

1. A lithographic apparatus, comprising:

a moveable substrate table constructed to hold a substrate to be exposed;

a projection system configured to project a patterned radiation beam onto a target portion on a side of the substrate to be exposed;

a liquid supply system configured to at least partly fill a region between the substrate and the projection system with a liquid; and

a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with the moveable substrate table in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid for all positions of the moveable substrate table relative to the liquid confinement structure during exposure of the substrate.

2. The apparatus according to claim 1, wherein a portion of the liquid confinement structure extends further towards the substrate than any part of a final element of the projection system.

3. The apparatus according to claim 1, wherein the substrate table comprises:

a substrate seat configured to hold the substrate; and

a sealing projection surrounding the substrate seat in a plane substantially perpendicular to the optical axis and configured to cooperate with the liquid confinement structure so as to substantially prevent liquid from escaping from the region between the substrate and the projection system.

4. The apparatus according to claim 3, wherein the sealing projection comprises a gas seal configured to substantially prevent flow of liquid through a gap between a surface of the liquid confinement structure and the sealing projection.

5. The apparatus according to claim 4, wherein the gas seal is arranged to produce a flow of gas within the gap that is directed substantially towards the optical axis in such a way as to at least partially confine the liquid.

6. The apparatus according to claim 1, wherein:

the liquid confinement structure comprises a gas seal, and

the substrate table comprises a sealing zone arranged to cooperate with the gas seal so as to substantially prevent liquid from escaping from the region between the substrate and the projection system.

11. The apparatus according to claim 1, wherein the substrate table comprises:

a substrate seat configured to hold the substrate; and

a sealing projection surrounding the substrate seat and extending along a direction that is oblique with respect to a plane of the substrate so as to substantially prevent liquid from escaping from the region between the substrate and the projection system.

12. The apparatus according to claim 11, wherein the direction is substrate substantially perpendicular to the plane of the substrate.

13. The apparatus according to claim 1, wherein the substrate table comprises a sealing projection surrounding the substrate during exposure of the substrate, the sealing projection configured to cooperate with the liquid confinement structure so as to substantially prevent liquid from escaping from the region between the substrate and the projection system.

14. The apparatus according to claim 13, wherein the sealing projection comprises a gas seal configured to substantially prevent flow of liquid through a gap between a surface of the liquid confinement structure and the sealing projection.

7. A device manufacturing method, comprising:

using a liquid confinement structure, that is fixed in a plane substantially perpendicular to an optical axis of a projection system of a lithographic apparatus and arranged to cooperate with a moveable substrate table of the lithographic apparatus holding a substrate, to restrict a liquid to a region above an upper surface of the substrate table and to maintain a side of the substrate to be exposed entirely immersed in the liquid for all positions of the moveable substrate table relative to the liquid confinement structure during exposure of the substrate; and

projecting a patterned radiation beam through the liquid onto a target portion of the substrate using the projection system.

8. The method according to claim 7, further comprising:

substantially preventing the liquid from escaping from a region between the substrate and the projection system using a sealing projection surrounding the substrate in a plane substantially perpendicular to the optical axis and configured to cooperate with the liquid confinement structure.

9. The method according to claim 8, comprising substantially preventing flow of liquid through a gap between a surface of the liquid confinement structure and the sealing projection using a gas seal.

10. The method according to claim 7, further comprising:

substantially preventing liquid from escaping from a region between the substrate and the projection system using a gas seal of the liquid confinement structure cooperating with a sealing zone of the substrate table.