Lithographic system, device manufacturing method, and mask optimization method
First Claim
1. A lithographic system, comprising:
- a patterning device configured to modulate a radiation beam;
a projection system configured to project the modulated radiation beam onto a target portion of a substrate;
datapath hardware configured to convert an input pattern file into a control signal that is used to control the patterning device; and
a conversion system configured to convert a requested device layout pattern into a spatial-frequency-restricted representation of the requested device layout pattern, as the input pattern file for the datapath hardware, wherein the spatial-frequency-restricted representation includes limited range of spatial-frequencies below a threshold;
wherein the threshold is determined by the spatial frequencies configured to be imaged by the projection system.
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Abstract
A lithographic system comprises an array of individually controllable elements, a projection system, datapath hardware, and a conversion system. The array of individually controllable elements is capable of modulating a radiation beam. The projection system is configured to project the modulated radiation beam onto a target portion of a substrate. The datapath hardware converts an input pattern file into a control signal for controlling the array of individually controllable elements. The conversion system is configured to convert a requested device layout pattern into an input pattern file for the datapath hardware. The input pattern file is a spatial-frequency-restricted representation of the requested device layout pattern.
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Citations
18 Claims
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1. A lithographic system, comprising:
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a patterning device configured to modulate a radiation beam; a projection system configured to project the modulated radiation beam onto a target portion of a substrate; datapath hardware configured to convert an input pattern file into a control signal that is used to control the patterning device; and a conversion system configured to convert a requested device layout pattern into a spatial-frequency-restricted representation of the requested device layout pattern, as the input pattern file for the datapath hardware, wherein the spatial-frequency-restricted representation includes limited range of spatial-frequencies below a threshold; wherein the threshold is determined by the spatial frequencies configured to be imaged by the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A device manufacturing method, comprising:
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modulating a radiation beam using a patterning device; projecting the modulated radiation beam onto a target portion of a substrate using a projection system; converting an input pattern file into a control signal for controlling the patterning device using datapath hardware; converting a requested device layout pattern into a spatial-frequency-restricted representation of the requested device layout pattern, wherein the spatial frequency-restricted representation includes limited range of spatial-frequencies below a threshold; and using the spatial-frequency-restricted representation of the requested device layout pattern as the input pattern file for the datapath hardware; wherein the threshold is determined by the spatial frequencies that are imagable by the projection system. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification