Exposure apparatus, exposure method, method for producing device, and optical part
First Claim
Patent Images
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which projects an image of a pattern onto the substrate;
a substrate table which holds the substrate;
a member provided exchangeably on the substrate table, at least a part of a surface of the member being liquid-repellent; and
an attaching/detaching mechanism which attaches/detaches the member with respect to the substrate table,wherein the member has a flat portion which is substantially flush with a surface of the substrate held by the substrate table, the flat portion being arranged around the substrate, andwherein the attaching/detaching mechanism is capable of detaching the member from the substrate table together with the substrate.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
-
Citations
37 Claims
-
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; a substrate table which holds the substrate; a member provided exchangeably on the substrate table, at least a part of a surface of the member being liquid-repellent; and an attaching/detaching mechanism which attaches/detaches the member with respect to the substrate table, wherein the member has a flat portion which is substantially flush with a surface of the substrate held by the substrate table, the flat portion being arranged around the substrate, and wherein the attaching/detaching mechanism is capable of detaching the member from the substrate table together with the substrate.
-
-
2. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, wherein the movable stage is a substrate stage which holds the substrate, and the substrate stage includes a holding portion which holds the member, and an attracting unit which detachably attaches the member to the holding portion, wherein the liquid-repellent member is a stepped member having a first surface which is opposed to a back surface of the substrate and a second surface which extends to outside of the substrate along a surface of the substrate, and wherein the exposure apparatus further comprises an outer member which has a third surface extending to outside of the liquid-repellent member along the surface of the substrate and which is engageable with the liquid-repellent member, wherein at least the third surface is liquid-repellent.
-
-
3. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, wherein the movable stage is a substrate stage which holds the substrate, and the substrate stage includes a holding portion which holds the member, and an attracting unit which detachably attaches the member to the holding portion, wherein the liquid-repellent member is a stepped member having a first surface which is opposed to a back surface of the substrate and a second surface which extends to outside of the substrate along a surface of the substrate, and wherein the exposure apparatus further comprises a lifting unit which moves the liquid-repellent member upwardly and downwardly with respect to the holding portion. - View Dependent Claims (4)
-
-
5. An exposure apparatus according, which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, wherein the movable stage is a substrate stage which holds the substrate, and the substrate stage includes a holding portion which holds the member, and an attracting unit which detachably attaches the member to the holding portion, wherein the liquid-repellent member is a substrate holder having a support portion which supports an edge portion of a back surface of the substrate, a flat surface which extends to outside of the substrate along a surface of the substrate, and a side wall which is connected to the flat surface and which is higher than the flat surface, and wherein the exposure apparatus further comprises a substrate table on which a substrate holder is placed, wherein the substrate holder and the substrate table have flow passages to make communication with each other respectively. - View Dependent Claims (6)
-
-
7. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, and wherein the liquid-repellent member includes at least a part of a reference member and a part of an optical sensor. - View Dependent Claims (8, 12)
-
-
9. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, and wherein the part of the liquid-repellent member, which is liquid-repellent, has a light irradiated surface;
an adhesive layer is formed on the light irradiated surface; and
an amorphous fluororesin layer is formed on a surface of the adhesive layer. - View Dependent Claims (10, 11)
-
-
13. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, and wherein an exchange timing for the member is determined on the basis of decrease in contact angle of the liquid at the liquid-repellent part of the member. - View Dependent Claims (14, 15)
-
-
16. An exposure method for performing liquid immersion exposure, for a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure method comprising:
-
supplying the liquid to at least a part of a surface of the substrate; and performing the liquid immersion exposure for the substrate by radiating the exposure light beam onto the substrate through the liquid, wherein; a part of the exposure apparatus, which is different from the substrate for which the liquid is supplied, is liquid-repellent, and the liquid-repellent part of the exposure apparatus is exchanged depending on deterioration of liquid repellence thereof, and the deterioration of the liquid repellence is judged depending on a totalized amount of radiation of ultraviolet light. - View Dependent Claims (17, 18, 35, 36, 37)
-
-
19. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a substrate table which holds the substrate, wherein a member, at least a part of a surface of which is liquid-repellent, is provided exchangeably on the substrate table, and wherein the member includes a reference member having an irradiated surface, at least a part of which is liquid-repellent. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
-
-
31. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; and a movable stage which is movable relative to the projection optical system, wherein, a liquid-repellent member, at least a part of which is liquid-repellent, is provided on the movable stage, and the liquid-repellent member is exchangeable, and wherein the liquid-repellent member includes a reference member having an irradiated surface, at least a part of which is liquid-repellent. - View Dependent Claims (32, 33, 34)
-
Specification