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Exposure apparatus, exposure method, method for producing device, and optical part

  • US 8,054,447 B2
  • Filed: 12/03/2004
  • Issued: 11/08/2011
  • Est. Priority Date: 12/03/2003
  • Status: Active Grant
First Claim
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

  • a projection optical system which projects an image of a pattern onto the substrate;

    a substrate table which holds the substrate;

    a member provided exchangeably on the substrate table, at least a part of a surface of the member being liquid-repellent; and

    an attaching/detaching mechanism which attaches/detaches the member with respect to the substrate table,wherein the member has a flat portion which is substantially flush with a surface of the substrate held by the substrate table, the flat portion being arranged around the substrate, andwherein the attaching/detaching mechanism is capable of detaching the member from the substrate table together with the substrate.

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