Exposure apparatus and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by forming a liquid immersion area on a part of the substrate and projecting an image of a pattern onto the substrate through a liquid in the liquid immersion area, the exposure apparatus comprising:
- a projection optical system which projects the image of the pattern onto the substrate;
a substrate stage on which the substrate is held, the substrate stage being movable below the projection optical system;
a liquid supply system having a supply inlet, which supplies the liquid onto the substrate to form the liquid immersion area;
a first liquid recovery system having a recovery port, which recovers the liquid from above a surface of the substrate; and
a second liquid recovery system which has a recovery port provided on the substrate stage and which recovers the liquid from a space under the projection optical system after completion of the exposure for the substrate.
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Abstract
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
292 Citations
38 Claims
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1. An exposure apparatus which exposes a substrate by forming a liquid immersion area on a part of the substrate and projecting an image of a pattern onto the substrate through a liquid in the liquid immersion area, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage on which the substrate is held, the substrate stage being movable below the projection optical system; a liquid supply system having a supply inlet, which supplies the liquid onto the substrate to form the liquid immersion area; a first liquid recovery system having a recovery port, which recovers the liquid from above a surface of the substrate; and a second liquid recovery system which has a recovery port provided on the substrate stage and which recovers the liquid from a space under the projection optical system after completion of the exposure for the substrate. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An exposure apparatus which exposes a substrate by forming a liquid immersion area on a part of the substrate and projecting an image of a pattern onto the substrate through a liquid in the liquid immersion area, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage on which the substrate is held, the substrate stage being movable relative to the projection optical system; a liquid supply system having a supply inlet which supplies the liquid onto the substrate to form the liquid immersion area; a first liquid recovery system having a recovery port, which recovers the liquid from a surface of the substrate; a second liquid recovery system which has a recovery port provided on the substrate stage and which recovers the liquid after completion of the exposure for the substrate; and a liquid-removing system which removes the liquid remaining on a part arranged in the vicinity of an image plane of the projection optical system. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. An exposure method comprising:
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holding a substrate on a substrate stage; supplying a liquid onto a surface of the substrate held on the substrate stage; recovering the liquid from above the surface of the substrate held on the substrate stage through a first recovery port; exposing the substrate held on the substrate stage by projecting an image of a pattern onto the substrate via a projection optical system and the liquid; and moving the substrate stage after completion of the exposure for the substrate, to place a second recovery port provided on the substrate stage under the projection optical system and recovering the liquid from a space under the projection optical system through the second recovery port. - View Dependent Claims (35, 36, 37, 38)
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Specification