Diffuser gravity support

• US 8,075,690 B2
• Filed: 09/19/2008
• Issued: 12/13/2011
• Est. Priority Date: 09/20/2004
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Keller, Ernst, White, John M., Tiner, Robin L., Kucera, Jiri, Choi, Soo Young, Park, Beom Soo, Starr, Michael
• Primary Examiner(s): Zervigon, Rudy
• Application Number:
  US12/234,359
• Publication Number:
  US 20090007846A1
• Time in Patent Office: 1,180 Days
• Field of Search: 118/715, 156/345.33, 156/345.34
• US Class Current: 118/715
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.

Claims

1. A substrate processing apparatus, comprising:

a chamber;

a backing plate coupled to the chamber and having at least one opening extending through the backing plate;

a gas distribution plate disposable within the chamber and having a plurality of gas passages extending therethrough, the gas distribution plate spaced from the backing plate to define a plenum therebetween;

a ball stud housing coupled with the gas distribution plate; and

at least one pivotal support member extending through the at least one opening in the backing plate and engaging the ball stud housing, the at least one support member comprising;

a ball stud;

a lower pivotal member coupled to the ball stud; and

an upper pivotal member coupled to the ball stud.

2. The apparatus of claim 1, wherein at least a portion of the gas distribution plate is supported at a perimeter by a flexible connection coupled to the chamber.

3. The apparatus of claim 1, the chamber further comprising:

a substrate support having a planar horizontal profile, the substrate support disposed below the gas distribution plate, and the gas distribution plate having a concave horizontal profile.

4. The apparatus of claim 1, the chamber further comprising:

a gas passage to deliver a process gas to the gas distribution plate.

5. The apparatus of claim 1, the gas distribution plate further comprising:

a first surface and a second surface opposite the first surface, wherein at least one of the plurality of gas passages extending therethrough has a first diameter at the first surface that is less than a second diameter of the at least one gas passage at the second surface.

6. A substrate processing apparatus, comprising:

a chamber body;

a gas distribution plate disposed within the chamber body, the gas distribution plate having a first;

surface and a second surface opposite the first surface, the gas distribution plate having a plurality of gas passages extending therethrough with at least one gas passage having a first diameter at the first surface that is less than a second diameter of the at least one gas passage at the second surface, the gas distribution plate also having at least one slot formed in the first surface that is separate and distinct from the plurality of gas passages;

a ball stud housing disposed in the at least one slot;

a backing plate having at least one opening extending therethrough that is axially aligned with a corresponding slot in the first surface, the backing plate spaced from the gas distribution plate to define a plenum therebetween; and

at least one pivotal support member disposed through the at least one opening and coupled to the backing plate and the ball stud housing, the at least one pivotal support member movable to adjust a spacing between the first surface and the backing plate, the at least one pivotal support member comprising;

a ball stud;

a lower pivotal member coupled to the ball stud; and

an upper pivotal member coupled to the ball stud.

7. The apparatus of claim 6, further comprising a substrate support disposed in the chamber body having a planar horizontal profile, the substrate support disposed below the gas distribution plate, and the gas distribution plate having a concave profile.

8. The apparatus of claim 6, wherein the backing plate has a gas passage disposed through the backing plate to deliver a process gas to the gas distribution plate.

9. The apparatus of claim 6, wherein the at least one pivotal support member comprises a plurality of support members.

10. A substrate processing apparatus, comprising:

a chamber body;

a gas distribution plate disposed within the chamber body, the gas distribution plate having a first surface and a second surface opposite the first surface, the gas distribution plate having a plurality of gas passages extending therethrough with at least one gas passage having a first diameter at the first surface that is less than a second diameter of the at least one gas passage at the second surface;

a ball stud housing disposed in the at least one slot;

a backing plate having at least one opening extending therethrough, the backing plate spaced from the gas distribution plate to define a plenum therebetween; and

at least one pivotal support member disposed through the at least one opening and coupled to the backing plate and the ball stud housing, the at least one pivotal support member movable to adjust a spacing between the first surface and the backing plate, the at least one pivotal support member comprising;

a ball stud;

a lower pivotal member coupled to the ball stud; and

an upper pivotal member coupled to the ball stud.

11. The apparatus of claim 10, further comprising a substrate support disposed in the chamber body having a planar horizontal profile, the substrate support disposed below the gas distribution plate, and the gas distribution plate having a concave horizontal profile.

12. The apparatus of claim 10, further comprising a gas passage disposed through the backing plate to deliver a process gas to the gas distribution plate.