×

Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition

  • US 8,080,365 B2
  • Filed: 06/15/2010
  • Issued: 12/20/2011
  • Est. Priority Date: 12/14/2007
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for manufacturing a semiconductor device, comprising:

  • forming a resist film formed of a resist composition on a processing surface;

    selectively exposing the resist film to light; and

    developing the resist film so as to pattern the resist film,wherein the resist composition contains a monomer unit containing a thiopyran derivative having the structure expressed by the general formula 1;

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×