Self aligned contact in a semiconductor device and method of fabricating the same
First Claim
1. A method of fabricating a self aligned contact in a semiconductor device comprising:
- etching a trench in a core area and partially extending into a termination area of a substrate;
growing a first oxide on said substrate proximate a wall and a bottom of said trench;
depositing a polysilicon layer in said core area and said termination area;
selectively etching said polysilicon layer to form a gate region in said core area portion of said trench, a first portion of a gate interconnect region in said termination area portion of said trench, and a second portion of said gate interconnect region in said termination area outside of said trench; and
selectively doping a periphery structure portion of said polysilicon layer in said termination area before said selectively etching said polysilicon layer.
4 Assignments
0 Petitions
Accused Products
Abstract
A method of fabricating a self-aligned contact in a semiconductor device, in accordance with one embodiment of the present invention, includes etching a trench in a core area and partially extending into a termination area of a substrate. A first oxide is grown on the substrate proximate the trench. A polysilicon layer is deposited in the core area and the termination area. The polysilicon layer is selectively etched to form a gate region in the core area portion of the trench. The etching of the polysilicon layer also forms a first portion of a gate interconnect region in the termination area portion of the trench and a second portion in the termination area outside of the trench.
72 Citations
18 Claims
-
1. A method of fabricating a self aligned contact in a semiconductor device comprising:
-
etching a trench in a core area and partially extending into a termination area of a substrate; growing a first oxide on said substrate proximate a wall and a bottom of said trench; depositing a polysilicon layer in said core area and said termination area; selectively etching said polysilicon layer to form a gate region in said core area portion of said trench, a first portion of a gate interconnect region in said termination area portion of said trench, and a second portion of said gate interconnect region in said termination area outside of said trench; and selectively doping a periphery structure portion of said polysilicon layer in said termination area before said selectively etching said polysilicon layer. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A method of fabricating a trench metal-oxide-semiconductor field effect transistor comprising:
-
depositing a sacrificial oxide layer on a substrate; depositing a first nitride layer on said sacrificial oxide layer; etching a trench through said first nitride layer and said sacrificial oxide layer and into a core area and partially extending into a termination area of said substrate; growing a first portion of a gate insulator region on said substrate proximate a walls and bottom of said trench to form a first portion of a gate insulator region; depositing a polysilicon layer in said core area and said termination area including said trench; etching-back said polysilicon to form a gate region in said core area portion of said trench, a first portion of a gate interconnect region in said termination area portion of said trench, and a second portion of said gate interconnect region in said termination area outside of said trench; depositing a dielectric layer on said gate region, gate interconnect region and said first nitride layer; etching-back said dielectric layer to form a second portion of said gate insulator region about said gate region and said gate interconnect region; removing said first nitride layer in said core area; implanting a body region in an upper portion of said substrate in said core area proximate said gate region to form a drain region in a lower portion of said substrate in said core area; and implanting a source region in said body region in said core area proximate said gate region, wherein said source region is separated from said drain region by said body region. - View Dependent Claims (8, 9, 10, 11, 12)
-
-
13. A method of fabricating a self aligned contact in a semiconductor device comprising:
-
etching a trench in a core area and partially extending into a termination area of a substrate; growing a first oxide on said substrate proximate a wall and a bottom of said trench; depositing a polysilicon layer in said core area and said termination area; selectively etching said polysilicon layer to form a gate region in said core area portion of said trench, a first portion of a gate interconnect region in said termination area portion of said trench, and a second portion of said gate interconnect region in said termination area outside of said trench; implanting a body region in a portion of said substrate in said core area proximate said gate region; and implanting a source region in a portion of said body region in said core area proximate said gate region gate region. - View Dependent Claims (14, 15, 16, 17, 18)
-
Specification