Standoff spectroscopy using a conditioned target

• US 8,080,796 B1
• Filed: 06/30/2010
• Issued: 12/20/2011
• Est. Priority Date: 06/30/2010
• Status: Active Grant

• Current Assignee: University of Tennessee Research Foundation (University of Teesside), UT-Battelle LLC
• Original Assignee: UT-Battelle LLC
• Inventors: Van Neste, Charles W., Morales-Rodriguez, Marissa E., Senesac, Lawrence R., Thundat, Thomas G.
• Primary Examiner(s): Kim, Kiho
• Application Number:
  US12/828,064
• Publication Number:
  US 20120002191A1
• Time in Patent Office: 538 Days
• Field of Search: 250330-335, 2503361-3362, 2503381-3384, 25033901-33915, 250/340, 2503411-3418, 588/309, 436/164
• US Class Current: 250/338.1
• CPC Class Codes: A61B 5/0071 by measuring fluorescence emission
• CPC Class Codes: A61B 5/444 Evaluating skin marks, e.g. mole, nevi, tumour, scar
• CPC Class Codes: G01J 3/10 Arrangements of light sources specially adapted for spectrometry or colorimetry
• CPC Class Codes: G01J 3/42 Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry beam switching arrangements G01J3/08
• CPC Class Codes: G01N 2021/1793 Remote sensing
• CPC Class Codes: G01N 2021/399 Diode laser
• CPC Class Codes: G01N 21/3563 for analysing solids; Preparation of samples therefor
• CPC Class Codes: G01N 21/47 Scattering, i.e. diffuse reflection G01N21/25, G01N21/41 take precedence G01N21/55 takes precedence
• CPC Class Codes: G01N 21/718 Laser microanalysis, i.e. with formation of sample plasma
• CPC Class Codes: G01N 2201/0616 Ambient light is used
• CPC Class Codes: G01N 2201/062 LED's

Abstract

A system and method are disclosed for standoff spectroscopy of molecules (e.g. from a residue) on a surface from a distance. A source emits radiation that modifies or conditions the residue, such as through photodecomposition. A spectral generating source measures a spectrum of the residue before and after the residue is exposed to the radiation from that source. The two spectra are compared to produce a distinct identification of the residues on the surface or identify certain properties of the residue.

Claims

1. A system for standoff spectroscopy to analyze a residue comprising:

a target surface for spectral analysis;

an infrared (“

IR”

) source that irradiates the target surface with IR radiation;

a detector that measures a spectrum from the target surface based on the IR radiation;

an ultraviolet (“

UV”

) source that irradiates the target surface with UV radiation, wherein the detector measures a first and second spectrum of the target surface away from the target surface based on radiation from the infrared source, wherein the second spectrum is measured by the detector after the ultraviolet source irradiates the target surface; and

a processor coupled with the detector and configured to perform the spectral analysis by comparing the first and second spectrum, wherein the spectral analysis determines whether the residue is present on the target surface based on the comparison of the first and second spectrum.

2. The system of claim 1 further comprising:

a collection optic configured to receive scattered radiation from the target surface and refocus the scattered radiation to the detector, wherein the IR radiation is scattered at the target surface to result in the scattered radiation.

3. The system of claim 1 wherein the spectral analysis comprises identifying wavelengths at which the UV radiation reacted with the residue.

4. A method for identifying a residue on a surface with standoff spectroscopy comprising:

detecting a first spectral measurement at the surface;

irradiating the surface with conditioning radiation at a predetermined frequency for causing a reaction with the residue on the surface;

detecting a second spectral measurement at the surface after the surface has received the conditioning radiation; and

comparing the second spectral measurement with the first spectral measurement to determine a presence of the residue by identifying wavelengths at which the conditioning radiation reacts with the residue.

5. The method of claim 4 wherein the detecting a first and second spectral measurement comprises:

emitting radiation from a spectral generating source towards the surface;

scattering the radiation from a spectral generating source;

collecting the scattered radiation from the surface; and

measuring the scattered radiation from the surface to generate the spectral measurement.

6. The method of claim 5 wherein the scattered pulsed light is reflected or refracted from the target.

7. The method of claim 5 wherein the radiation from the spectral generating source comprises infrared radiation.

8. The method of claim 4 wherein the conditioning radiation comprises ultraviolet radiation and the reaction comprises a decomposition of the residue caused by the ultraviolet radiation.

9. The method of claim 4 wherein the comparison comprises dividing the first spectrum from the second spectrum to identify the wavelengths at which the conditioning radiation reacted with the residue.

10. The method of claim 4 wherein the identified wavelengths correspond with particular residues such that an identification of a wavelength can identify the residue.

11. The method of claim 10 wherein the predetermined frequency of the radiation corresponds with a particular residue that is to be identified.

12. The method of claim 4 wherein the comparison is performed using a processor that accesses the first and second spectrums which are stored in a memory.

13. A system for standoff spectroscopy of a residue comprising:

a spectral generating source configured to emit a first type of radiation;

a target comprising the residue on a surface of the target;

a conditioning source configured to emit a second type of radiation to react with the residue on the surface, wherein the reaction modifies a spectrum of the residue on the surface;

a detector configured to measure a first spectrum from the spectral generating source and to measure a second spectrum from the spectral generating source, wherein the second spectrum is measured after the conditioning source after the reaction with the emitted second type of radiation; and

a processor configured to identify the residue by comparing the second spectrum with the first spectrum.

14. The system of claim 13 further comprising:

a collection optic that focuses the first type of radiation onto the detector for measuring the first and second spectrums.

15. The system of claim 13 wherein the analysis of the residue by the processor comprises identifying wavelengths at which the second type of radiation reacts with the residue.

16. The system of claim 15 wherein the comparison comprises dividing the first spectrum from the second spectrum to identify the wavelengths at which the conditioning radiation reacted with the residue.

17. The system of claim 13 wherein the reaction comprises decomposition, sublimation, vaporization, bleaching, absorption, or another response by the residue.

18. The system of claim 13 wherein the comparison is configured to identify the residue based on differences in the second spectrum from the first spectrum.

19. The system of claim 13 wherein the second type of radiation is at a predetermined wavelength, further wherein that predetermined wavelength is known to cause a reaction with certain molecules in the residue.

20. The system of claim 19 wherein evidence of the reaction signifies the presence of the certain molecules in the residue.