Bolometer and method of producing a bolometer

• US 8,080,797 B2
• Filed: 09/08/2006
• Issued: 12/20/2011
• Est. Priority Date: 09/08/2006
• Status: Active Grant

• Current Assignee: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forsching E.V.
• Original Assignee: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forsching E.V.
• Inventors: Vogt, Holger, Russ, Marco
• Primary Examiner(s): Porta, David
• Assistant Examiner(s): Lee, Shun
• Application Number:
  US12/440,274
• Publication Number:
  US 20090321644A1
• Time in Patent Office: 1,929 Days
• Field of Search: 250/338.3, 250/338.4
• US Class Current: 250/338.4
• CPC Class Codes: G01J 5/06 Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity for adjusting of solid angle of collected radiation G01J5/07; means for wavelength selection G01J5/0801
• CPC Class Codes: G01J 5/20 using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
• CPC Class Codes: H01L 27/14669 Infrared imagers

Abstract

A bolometer includes a membrane, a first spacer and a second spacer, the membrane including resistive and contact layers. At a side facing a foundation, the contact layer has a first contact region at which the first spacer electrically contacts the contact layer, and a second contact region at which the second spacer electrically contacts the contact layer. In this manner, the membrane is kept at a predetermined distance to the foundation. The contact layer is laterally interrupted by a gap, so that the contact layer is subdivided at least into two parts, the first part including the first contact region, and the second part including the second contact region, and no direct connection existing within the contact layer from the first contact region to the second contact region, and the resistive layer being in contact with the first and second parts of the contact layer.

Claims

1. A bolometer comprising:

a membrane;

a first spacer;

a second spacer,

the membrane comprising a resistive layer, a first protective layer, a second protective layer, and a contact layer, the resistive layer and the contact layer extending between the first protective layer and the second protective layer with the first protective layer being located at a side of the membrane facing a foundation, the first protective layer including a first through hole and a second through hole, the contact layer comprising, at a side facing the foundation, a first contact region at which the first spacer extends through the first through hole in the first protective layer and electrically contacts the contact layer, and a second contact region at which the second spacer extends through the second through hole in the first protective layer and electrically contacts the contact layer, and the first and second spacers keeping the membrane at a predetermined distance from the foundation,

the contact layer being laterally interrupted by a gap, so that the contact layer is subdivided at least into two parts, the first part of which comprises the first contact region, and the second part of which comprises the second contact region, and no direct connection existing within the contact layer from the first contact region to the second contact region, and

the resistive layer being in contact with the first part of the contact layer and with the second part of the contact layer, wherein

the membrane is patterned so that a first ridge and a second ridge for thermal insulation are provided in the membrane, the first ridge includes the first contact region in contact with the first spacer, and the second ridge includes the second contact region in contact with the second spacer.

2. The bolometer as claimed in claim 1, wherein lateral ends of the membrane are substantially flush with the first spacer and the second spacer.

3. The bolometer as claimed in claim 1, wherein the predetermined distance equals a quarter of an infrared wavelength.

4. The bolometer as claimed in claim 1, wherein the contact layer comprises a layer thickness so that a layer resistance of the membrane corresponds to a characteristic impedance of electromagnetic waves in air.

5. The bolometer as claimed in claim 1, wherein the foundation comprises a reflector.

6. The bolometer as claimed in claim 1, wherein the membrane comprises, in a top view of a side facing away from the foundation, a substantially square shape, and wherein the first spacer and the second spacer are located at opposing corner points of the membrane.

7. The bolometer as claimed in claim 1, wherein the gap comprises a width such that a resistance contribution to a measuring resistor of the bolometer, which is due to a current flowing between the first contact region and the second contact region, ranges approximately between 1 kΩ

and 100 MΩ

.

8. The bolometer as claimed in claim 1, wherein a position of the gap is selected such that an electric current from the first spacer to the second spacer reaches the gap after having covered a certain distance, and wherein the distance covered is equal to a distance, as far as possible, covered by the electric current on its way from the gap to the second spacer.

9. The bolometer as claimed in claim 1, wherein the membrane further comprises an insulating layer arranged between the resistive layer and the contact layer, and wherein the resistive layer is located on the side of the membrane which faces the foundation.

10. The bolometer as claimed in claim 1, wherein the membrane further comprises an insulating layer arranged between the contact layer and the resistive layer, and wherein the contact layer is located on the side of the membrane which faces the foundation.

11. The bolometer as claimed in claim 1, wherein the resistive layer comprises amorphous silicon or vanadium oxide.

12. The bolometer as claimed in claim 1, wherein the contact layer comprises titanium nitride.

13. The bolometer as claimed in claim 1, wherein the first spacer and/or the second spacer comprise tungsten or copper.

14. The bolometer as claimed in claim 1, wherein the foundation further comprises a first terminal pad and a second terminal pad arranged to contact the first spacer and the second spacer, respectively.

15. A method of producing a bolometer, comprising the steps of:

a) providing a substrate;

b) depositing a sacrificial layer onto the substrate;

c) depositing a first protective layer on the sacrificial layer;

d) forming a first through opening and a second through opening through the sacrificial layer and the first protective layer so as to extend to the substrate;

e) forming first and second spacers in the first and second through openings;

f) applying a contact layer such that the contact layer comprises, at a side facing the substrate, a first contact region at which same is contacted by the first spacer, and a second contact region at which same is contacted by the second spacer;

g) patterning the contact layer so as to form a gap within same, so that the contact layer is subdivided into two parts, the first part of which comprises the first contact region, and the second part of which comprises the second contact region, and no direct connection existing within the contact layer from the first contact region to the second contact region;

h) applying a resistive layer such that the resistive layer is in contact with the first part of the contact layer and with the second part of the contact layer, the resistive layer and the contact layer forming a membrane of the bolometer;

i) depositing a second protective layer;

j) patterning an outline of the membrane; and

k) patterning the membrane in order to form within same a first ridge and a second ridge for thermal insulation, the first ridge being in contact with the first spacer, and the second ridge being in contact with the second spacer;

l) removing the sacrificial layer.

16. The method as claimed in claim 15, wherein a sequence of the steps is defined by the steps of depositing the sacrificial layer onto the substrate, applying the contact layer, patterning the contact layer, applying the resistive layer, and patterning the outline of the membrane.

17. The method as claimed in claim 15, further comprising a step of depositing a reflector between the steps of providing the substrate and depositing the sacrificial layer.

18. The method as claimed in claim 15, further comprising, between the steps of patterning the contact layer and applying the resistive layer, a step of applying an insulating layer such that the insulating layer leaves open the first part at a first contact point and the second part at a second contact point.

19. The method as claimed in claim 15, wherein the step of applying the sacrificial layer is performed such that the sacrificial layer comprises a layer thickness which corresponds to a quarter of an infrared wavelength.

20. The method as claimed in claim 15, wherein the step of applying the contact layer is performed such that the contact layer comprises a layer thickness such that the sheet resistance of the membrane corresponds to a characteristic impedance of an electromagnetic wave in air.

21. The method as claimed in claim 15, wherein the step of providing the substrate comprises the steps of:

a1) providing the substrate; and

a2) forming a first terminal pad and a second terminal pad on the substrate, the first terminal pad contacting the first spacer, and the second terminal pad contacting the second spacer.

22. The method as claimed in claim 15, wherein the step of applying the resistive layer comprises using amorphous silicon oxide or vanadium oxide.

23. The method as claimed in claim 15, wherein the step of applying the contact layer comprises using titanium nitride, and the step of forming the first and second spacers comprises using tungsten or copper.

24. The method as claimed in claim 15, wherein the step of depositing the sacrificial layer comprises chemical vapor deposition.

25. The method as claimed in claim 15, wherein the step of depositing the first protective layer and the step of depositing the second protective layer are performed such that the first and second protective layers comprise oxide, the step of applying the sacrificial layer is performed such that the sacrificial layer comprises amorph silicon, and the step of removing the sacrificial layer comprises selective isotropic etching the sacrificial layer.

26. A method of producing a bolometer, comprising the steps of:

a) providing a substrate;

b) depositing a sacrificial layer onto the substrate;

c) depositing a first protective layer on the sacrificial layer;

d) forming a first through opening and a second through opening through the sacrificial layer and the first protective layer so as to extend to the substrate;

e) forming a first spacer within the first through opening and a second spacer within the second through opening;

f) laterally applying a resistive layer such that the resistive layer is not in contact with conductive material within the first and second through openings;

g) applying an insulating layer on a side of the resistive layer which faces away from the substrate, so that the insulating layer leaves the resistive layer open at a first contact point and at a second contact point;

h) applying a contact layer such that the contact layer comprises, at a side facing the substrate, a first contact region at which same is contacted by the first spacer, and a second contact region at which same is contacted by the second spacer, and such that the contact layer is in contact with the first contact point and with the second contact point of the resistive layer;

i) patterning an outline of the membrane;

j) patterning the membrane in order to form within same a first ridge and a second ridge for thermal insulation, the first ridge being in contact with the first spacer, and the second ridge being in contact with the second spacer;

k) patterning the contact layer in order to form at least one gap within same, so that the contact layer is subdivided into at least two parts, the first part of which comprises the first contact region and the first contact point of the resistive layer, and the second part of which comprises the second contact region and the second contact point of the resistive layer, and no direct connection existing within the contact layer from the first contact region to the second contact region;

l) depositing a second protective layer; and

m) removing the sacrificial layer.

27. The method as claimed in claim 26, wherein a sequence of steps is defined by the steps of forming the first spacer, laterally applying the resistive layer, applying the insulating layer, applying the contact layer, patterning the outline of the membrane, and patterning the membrane.

28. The method as claimed in claim 26, further comprising, between the steps of providing the substrate and depositing the sacrificial layer:

depositing a reflector;

forming a first terminal pad and a second terminal pad on the substrate; and

the first terminal pad contacting the first spacer, and the second terminal pad contacting the second spacer.

29. The method as claimed in claim 26, wherein the step of depositing the sacrificial layer is performed such that the sacrificial layer comprises a layer thickness which corresponds to a quarter of an infrared wavelength.

30. The method as claimed in claim 26, wherein the step of depositing the first protective layer being performed between the steps of depositing the sacrificial layer and forming the first through opening and a second through opening, and the step of depositing the second protective layer being performed between the steps of patterning the contact layer and removing the sacrificial layer.

31. The method as claimed in claim 26, wherein the step of patterning the contact layer comprises the step of forming a second gap, so that the contact layer further comprises a third part, and wherein the step of applying the contact layer is performed such that the third part comprises a layer thickness such that a sheet resistance of the membrane corresponds to a characteristic impedance of an electromagnetic wave in air.

32. The method as claimed in claim 26, wherein the step of depositing the first protective layer and the step of depositing the second protective layer are performed such that the first and second protective layers comprise oxide, the step of applying the sacrificial layer is performed such that the sacrificial layer comprises amorph silicon, and the step of removing the sacrificial layer comprises selective isotropic etching the sacrificial layer.