Semiconductor component having a space saving edge structure
First Claim
1. A semiconductor component comprising:
- a semiconductor body comprising a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type;
at least one active component zone of a second conductivity type, which is complementary to the first conductivity type, being disposed in the inner region in the first semiconductor layer; and
an edge structure disposed in the edge region and comprising at least one trench extending from the first side into the semiconductor body, an edge electrode disposed in the trench, a dielectric layer disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoining the trench and being at least partially disposed below the trench,wherein the edge electrode is electrically coupled to a semiconductor zone, the semiconductor zone being doped complementarily to a basic doping of the semiconductor layer and being disposed between the edge trench and the inner region, andwherein the edge electrode disposed in the trench is ring-shaped and surrounds a transistor structure of the inner region.
1 Assignment
0 Petitions
Accused Products
Abstract
A Semiconductor component having a space saving edge structure is disclosed. One embodiment provides a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type. At least one active component zone of a second conductivity type, which is complementary to the first conductivity type, is disposed in the inner region in the first semiconductor layer. An edge structure is disposed in the edge region and includes at least one trench extending from the first side into the semiconductor body. An edge electrode is disposed in the trench, a dielectric layer is disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoin the trench and are at least partially disposed below the trench.
-
Citations
11 Claims
-
1. A semiconductor component comprising:
-
a semiconductor body comprising a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type; at least one active component zone of a second conductivity type, which is complementary to the first conductivity type, being disposed in the inner region in the first semiconductor layer; and an edge structure disposed in the edge region and comprising at least one trench extending from the first side into the semiconductor body, an edge electrode disposed in the trench, a dielectric layer disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoining the trench and being at least partially disposed below the trench, wherein the edge electrode is electrically coupled to a semiconductor zone, the semiconductor zone being doped complementarily to a basic doping of the semiconductor layer and being disposed between the edge trench and the inner region, and wherein the edge electrode disposed in the trench is ring-shaped and surrounds a transistor structure of the inner region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A semiconductor component comprising:
-
a semiconductor body comprising a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type; at least one active component zone of a second conductivity type, which is complementary to the first conductivity type, being disposed in the inner region in the first semiconductor layer; and an edge structure disposed in the edge region and comprising at least one trench extending from the first side into the semiconductor body, an edge electrode disposed in the trench, a dielectric layer disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoining the trench and being at least partially disposed below the trench, wherein the first edge zone has a doping concentration such that the first edge zone is completely depleted when applying a blocking voltage to the component, wherein the edge electrode is electrically coupled to a semiconductor zone, the semiconductor zone being doped complementarily to a basic doping of the semiconductor layer and being disposed between the edge trench and the inner region, and wherein the edge electrode disposed in the trench is ring-shaped and surrounds a transistor structure of the inner region.
-
Specification