Method for a bin ratio forecast at new tape out stage
First Claim
1. A method comprising:
- collecting historical data from a plurality of processed wafers lots;
collecting measurement data from one or more skew wafer lots;
generating an estimated baseline distribution from the collected historical data and collected measurement data;
generating an estimated performance distribution from the estimated baseline distribution based on one or more specified parameters and;
determining a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the estimated performance distribution;
determining one or more production targets based on the bin ratio forecast;
providing fabrication resources according to the one or more production target; and
processing a plurality of wafers based on the one or more determined production targets.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for providing a bin ratio forecast at an early stage of integrated circuit device manufacturing processes is disclosed. The method comprises collecting historical data from one or more processed wafer lots; collect measurement data from one or more skew wafer lots; generating an estimated baseline distribution from the collected historical data and collected measurement data; generating an estimated performance distribution based on one or more specified parameters and the generated estimated baseline distribution; determining a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the generated estimated performance distribution; determining one or more production targets based on the bin ratio forecast; and processing one or more wafers based on the one or more determined production targets.
-
Citations
20 Claims
-
1. A method comprising:
-
collecting historical data from a plurality of processed wafers lots; collecting measurement data from one or more skew wafer lots; generating an estimated baseline distribution from the collected historical data and collected measurement data; generating an estimated performance distribution from the estimated baseline distribution based on one or more specified parameters and; determining a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the estimated performance distribution; determining one or more production targets based on the bin ratio forecast; providing fabrication resources according to the one or more production target; and processing a plurality of wafers based on the one or more determined production targets. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A method for providing a bin ratio forecast prior to a mass production stage of a plurality of integrated circuit devices, the method comprising:
-
generating a simulated wafer acceptance test (WAT) baseline distribution; generating a simulated circuit performance distribution from the generated simulated WAT distribution; portioning the generated simulated circuit performance distribution into at least two bin categories based on a bin definition; determining a bin ratio forecast by applying a yield degradation factor to each bin category; determining a wafer quantity and device targets to begin processing based on the determined bin ratio forecast; and processing the determined wafer quantity according to the determined device targets. - View Dependent Claims (14, 15, 16, 17, 18, 19)
-
-
20. A system for providing a bin ratio forecast prior to a mass production stage in a semiconductor manufacturing environment, wherein a plurality of processes are performed on a plurality of wafer lots, the system comprising:
-
a virtual fabrication system coupled to a network; a manufacturing execution system (MES) coupled to the network, wherein the MES comprises a bin-based control module configured to; collect historical data from one or more processed wafer lots; collect measurement data from one or more skew wafer lots; generate an estimated baseline distribution based on the collected historical data and collected measurement data; generate an estimated performance distribution based on one or more specified parameters and the generated estimated baseline distribution; determine a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the generated estimated performance distribution; determine one or more production targets based on the bin ratio forecast; and process one or more wafers based on the one or more determined production targets.
-
Specification