Method for manufacturing a ferroelectric member element structure
First Claim
1. A method for manufacturing a piezoelectric/electrostrictive element structure having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
- forming a buffer layer on a substrate at least having a monocrystal surface, said buffer layer including a first oriented grown portion;
forming said first electrode on said buffer layer, said first electrode including a second oriented grown portion corresponding to said first oriented grown portion;
forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive portion disposed over said second oriented grown portion, and a second piezoelectric/electrostrictive portion not disposed over said second oriented grown portion, said first piezoelectric/electrostrictive portion and said second piezoelectric/electrostrictive portion being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive portion being higher than a degree of orientation of said second piezoelectric/electrostrictive portion; and
removing said second piezoelectric/electrostrictive portion from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive portion.
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Accused Products
Abstract
A method for manufacturing a ferroelectric member element structure having a ferroelectric member film, and lower and upper electrodes between which the ferroelectric member film is sandwiched, includes the steps of: forming a buffer layer having pattern-shaped oriented growth on a monocrystal substrate; performing oriented growth of the lower electrode layer on the buffer layer; performing oriented growth of the ferroelectric member film to cover the buffer layer and the lower electrode layer; and removing a portion of the ferroelectric member film other than the portion having the oriented growth achieved along the pattern of the buffer layer, by means of an etching treatment.
54 Citations
20 Claims
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1. A method for manufacturing a piezoelectric/electrostrictive element structure having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer on a substrate at least having a monocrystal surface, said buffer layer including a first oriented grown portion; forming said first electrode on said buffer layer, said first electrode including a second oriented grown portion corresponding to said first oriented grown portion; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive portion disposed over said second oriented grown portion, and a second piezoelectric/electrostrictive portion not disposed over said second oriented grown portion, said first piezoelectric/electrostrictive portion and said second piezoelectric/electrostrictive portion being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive portion being higher than a degree of orientation of said second piezoelectric/electrostrictive portion; and removing said second piezoelectric/electrostrictive portion from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a piezoelectric/electrostrictive element structure having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer having oriented growth on a substrate at least having a monocrystal surface; forming said first electrode in a pattern having oriented growth on said buffer layer; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive portion disposed over the pattern of said first electrode, and a second piezoelectric/electrostrictive portion not disposed over the pattern of said first electrode, said first piezoelectric/electrostrictive portion and said second piezoelectric/electrostrictive portion being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive portion being higher than a degree of orientation of said second piezoelectric/electrostrictive portion; and removing said second piezoelectric/electrostrictive portion from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive portion. - View Dependent Claims (11, 12, 13, 14)
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15. A method for manufacturing a liquid jet head comprising a liquid chamber communicating with a discharge port for discharging liquid, and a piezoelectric/electrostrictive element structure provided in correspondence to said liquid chamber and having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer on a substrate at least having a monocrystal surface, said buffer layer including a first oriented grown portion; forming said first electrode on said buffer layer, said first electrode including a second oriented grown portion corresponding to said first oriented grown portion; forming a piezoelectric/electrostrictive layer on at least said first electrode, the piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive portion disposed over said second oriented grown portion, and a second piezoelectric/electrostrictive portion not disposed over said second oriented grown portion, said first piezoelectric/electrostrictive portion and said second piezoelectric/electrostrictive portion being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive portion being higher than a degree of orientation of said second piezoelectric/electrostrictive portion; and removing said second piezoelectric/electrostrictive portion from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive portion.
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16. A method for manufacturing a liquid jet head comprising a liquid chamber communicating with a discharge port for discharging liquid, and a piezoelectric/electrostrictive element structure provided in correspondence to said liquid chamber and having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer having oriented growth on a substrate at least having a monocrystal surface; forming said first electrode in a pattern having oriented growth on said buffer layer; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive portion disposed over the pattern of said first electrode, and a second piezoelectric/electrostrictive portion not disposed over the pattern of said first electrode, said first piezoelectric/electrostrictive portion and said second piezoelectric/electrostrictive portion being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive portion being higher than a degree of orientation of said second piezoelectric/electrostrictive portion; and removing said second piezoelectric/electrostrictive portion from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive portion.
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17. A method for manufacturing a piezoelectric/electrostrictive element structure having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer on a substrate at least having a monocrystal surface, said buffer layer including a first oriented grown region; forming said first electrode on said buffer layer, said first electrode including a second oriented grown region corresponding to said first oriented grown region; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive region disposed over said second oriented grown region, and a second piezoelectric/electrostrictive region not disposed over said second oriented grown portion, said first piezoelectric/electrostrictive region and said second piezoelectric/electrostrictive region being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive region being higher than a degree of orientation of said second piezoelectric/electrostrictive region; and removing said second piezoelectric/electrostrictive region from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive region.
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18. A method for manufacturing a piezoelectric/electrostrictive element structure having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer having oriented growth on a substrate at least having a monocrystal surface; forming said first electrode in a pattern having oriented growth on said buffer layer; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive region disposed over the pattern of said first electrode, and a second piezoelectric/electrostrictive region not disposed over the pattern of said first electrode, said first piezoelectric/electrostrictive region and said second piezoelectric/electrostrictive region being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive region being higher than a degree of orientation of said second piezoelectric/electrostrictive region; and removing said second piezoelectric/electrostrictive region from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive region.
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19. A method for manufacturing a liquid jet head comprising a liquid chamber communicating with a discharge port for discharging liquid, and a piezoelectric/electrostrictive element structure provided in correspondence to said liquid chamber and having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer on a substrate at least having a monocrystal surface, said buffer layer including a first oriented grown region; forming said first electrode on said buffer layer, said first electrode including a second oriented grown region corresponding to said first oriented grown region; forming a piezoelectric/electrostrictive layer on at least said first electrode, the piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive region disposed over said second oriented grown region, and a second piezoelectric/electrostrictive region not disposed over said second oriented grown region, said first piezoelectric/electrostrictive region and said second piezoelectric/electrostrictive region being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive region being higher than a degree of orientation of said second piezoelectric/electrostrictive region; and removing said second piezoelectric/electrostrictive region from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive region.
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20. A method for manufacturing a liquid jet head comprising a liquid chamber communicating with a discharge port for discharging liquid, and a piezoelectric/electrostrictive element structure provided in correspondence to said liquid chamber and having a piezoelectric/electrostrictive film, and first and second electrodes between which said piezoelectric/electrostrictive film is sandwiched, the method comprising the steps of:
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forming a buffer layer having oriented growth on a substrate at least having a monocrystal surface; forming said first electrode in a pattern having oriented growth on said buffer layer; forming a piezoelectric/electrostrictive layer on at least said first electrode, said piezoelectric/electrostrictive layer including a first piezoelectric/electrostrictive region disposed over the pattern of said first electrode, and a second piezoelectric/electrostrictive region not disposed over the pattern of said first electrode, said first piezoelectric/electrostrictive region and said second piezoelectric/electrostrictive region being distributed in a direction perpendicular to a thickness direction of said piezoelectric/electrostrictive layer, a degree of orientation of said first piezoelectric/electrostrictive region being higher than a degree of orientation of said second piezoelectric/electrostrictive region; and removing said second piezoelectric/electrostrictive region from said piezoelectric/electrostrictive layer so as to form said piezoelectric/electrostrictive film from said first piezoelectric/electrostrictive region.
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Specification