Securities, chip mounting product, and manufacturing method thereof
First Claim
Patent Images
1. A semiconductor device comprising:
- a circuit including;
a memory cell including a transistor;
a first wiring; and
a second wiringwherein one of a source and a drain of the transistor is connected to one of the first wiring and the second wiring by disconnecting the other of the first wiring and the second wiring with laser cutting.
0 Assignments
0 Petitions
Accused Products
Abstract
The invention provides an ID chip with reduced cost, increased impact resistance and attractive design, as well as products and the like mounting the ID chip and a manufacturing method thereof. In view of the foregoing, an integrated circuit having a semiconductor film with a thickness of 0.2 μm or less is mounted on securities including bills, belongings, containers of food and drink, and the like (hereinafter referred to as products and the like). The ID chip of the invention can be reduced in cost and increased in impact resistance as compared with a chip formed over a silicon wafer while maintaining an attractive design.
-
Citations
24 Claims
-
1. A semiconductor device comprising:
-
a circuit including; a memory cell including a transistor; a first wiring; and a second wiring wherein one of a source and a drain of the transistor is connected to one of the first wiring and the second wiring by disconnecting the other of the first wiring and the second wiring with laser cutting. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A semiconductor device comprising:
-
a circuit including; a memory cell including a transistor; a bit line; a word line; a first wiring; and a second wiring wherein one of a source and a drain of the transistor is connected to one of the first wiring and the second wiring by disconnecting the other of the first wiring and the second wiring with laser cutting, wherein the bit line is connected to the other of the source and the drain of the transistor, and wherein the word line is connected to a gate of the transistor. - View Dependent Claims (9, 10, 11, 12, 13, 14)
-
-
15. A manufacturing method of a semiconductor device, comprising the steps of:
-
forming a semiconductor film; forming a first wiring and a second wiring over the semiconductor film; disconnecting one of the first wiring and the second wiring with laser cutting, whereby connecting the semiconductor film to the other of the first wiring and the second wiring; and forming a memory cell including the semiconductor film and the other of the first wiring and the second wiring by the disconnecting step. - View Dependent Claims (16, 17, 18, 19)
-
-
20. A manufacturing method of a semiconductor device, comprising the steps of:
-
forming a transistor; forming a first wiring and a second wiring over the transistor; disconnecting one of the first wiring and the second wiring with laser cutting, whereby connecting one of a source and a drain of the transistor to the other of the first wiring and the second wiring; and forming a memory cell including the transistor and the other of the first wiring and the second wiring by the disconnecting step. - View Dependent Claims (21, 22, 23, 24)
-
Specification