Nitride semiconductor LED and fabrication method thereof
First Claim
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1. A light emitting diode, comprising:
- a first conductive semiconductor layer;
an active layer on the first conductive semiconductor layer;
a second conductive semiconductor layer on the active layer;
a third conductive semiconductor layer on the second conductive semiconductor layer;
a fourth semiconductor layer on the third conductive semiconductor layer, anda fifth semiconductor layer formed on a surface of the fourth semiconductor layer,wherein the fourth semiconductor layer comprises portions partially protruded from the third conductive semiconductor layer and the portions are spaced apart from each other,wherein the fourth semiconductor layer includes a dopant of an opposite polarity from a polarity of the first conductive semiconductor layer,wherein the first conductive semiconductor layer, the third conductive semiconductor layer and the fifth semiconductor layer comprise an n-type semiconductor layer,wherein the second conductive semiconductor layer and the fourth semiconductor layer comprise a p-type semiconductor layer.
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Abstract
A nitride semiconductor light emitting diode according to the present invention, includes: a substrate; a buffer layer formed on the substrate; an In-doped GaN layer formed on the buffer layer; a first electrode layer formed on the In-doped GaN layer; an InxGa1−xN layer formed on the first electrode layer; an active layer formed on the InxGa1−xN layer; a first P—GaN layer formed on the active layer; a second electrode layer formed on the first P—GaN layer; a second P—GaN layer partially protruded on the second electrode layer; and a third electrode formed on the second P—GaN layer.
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Citations
16 Claims
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1. A light emitting diode, comprising:
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a first conductive semiconductor layer; an active layer on the first conductive semiconductor layer; a second conductive semiconductor layer on the active layer; a third conductive semiconductor layer on the second conductive semiconductor layer; a fourth semiconductor layer on the third conductive semiconductor layer, and a fifth semiconductor layer formed on a surface of the fourth semiconductor layer, wherein the fourth semiconductor layer comprises portions partially protruded from the third conductive semiconductor layer and the portions are spaced apart from each other, wherein the fourth semiconductor layer includes a dopant of an opposite polarity from a polarity of the first conductive semiconductor layer, wherein the first conductive semiconductor layer, the third conductive semiconductor layer and the fifth semiconductor layer comprise an n-type semiconductor layer, wherein the second conductive semiconductor layer and the fourth semiconductor layer comprise a p-type semiconductor layer. - View Dependent Claims (2, 3, 4, 5)
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6. A light emitting diode, comprising:
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a first conductive semiconductor layer; an active layer on the first conductive semiconductor layer; a second conductive semiconductor layer on the active layer; a third conductive semiconductor layer on the second conductive semiconductor layer; a fourth semiconductor layer on the third conductive semiconductor layer; and a fifth semiconductor layer formed on a surface of the fourth semiconductor layer, wherein the third conductive semiconductor layer and the second conductive semiconductor layer have substantially the same width, wherein the fourth semiconductor layer comprises portions partially protruded from the third conductive semiconductor layer and the portions are spaced apart from each other, wherein the fourth semiconductor layer includes a dopant of an opposite polarity from a polarity of the first conductive semiconductor layer, wherein the first conductive semiconductor layer, the third conductive semiconductor layer and the fifth semiconductor layer comprise an n-type semiconductor layer, wherein the second conductive semiconductor layer and the fourth semiconductor layer comprise a p-type semiconductor layer. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13)
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14. A light emitting diode, comprising:
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a first conductive semiconductor layer; an active layer on the first conductive semiconductor layer; a second conductive semiconductor layer on the active layer; a third conductive semiconductor layer on the second conductive semiconductor layer; a fourth semiconductor layer on the third conductive semiconductor layer; and a fifth semiconductor layer formed on a surface of the fourth semiconductor layer, wherein the third conductive semiconductor layer and the second conductive semiconductor layer have substantially the same width, wherein the fourth semiconductor layer comprises portions partially protruded from the third conductive semiconductor layer and the portions are spaced apart from each other, wherein the fourth semiconductor layer includes a dopant of an opposite polarity from a polarity of the first conductive semiconductor layer, wherein the fifth semiconductor layer includes a super lattice structure of a InGaN based layer/InGaN based layer on the fourth semiconductor layer portions spaced apart from each other. - View Dependent Claims (15, 16)
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Specification