Environmental system including vacuum scavenge for an immersion lithography apparatus

• US 8,089,610 B2
• Filed: 02/02/2007
• Issued: 01/03/2012
• Est. Priority Date: 04/10/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hazelton, Andrew J., Sogard, Michael
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/701,378
• Publication Number:
  US 20070132974A1
• Time in Patent Office: 1,796 Days
• Field of Search: 355/30, 355/52, 355/53, 355/55, 355/67
• US Class Current: 355/53
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

Claims

1. A lithographic projection method comprising:

filling a space between a projection system and a surface of a substrate with a liquid during exposure of the substrate using a liquid confinement member which is positioned adjacent a final surface of the projection system;

projecting an image onto the substrate by the projection system during the exposure;

supplying a gas from an inlet of the liquid confinement member, the inlet being arranged to oppose the surface of the substrate during the exposure; and

removing fluid via an outlet of the liquid confinement member, that is located further outward from the space than is the inlet, the outlet being arranged to oppose the surface of the substrate during the exposure.

2. The method according to claim 1, wherein the inlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is arranged to oppose the surface of the substrate during the exposure, and the inlet comprises a groove in the face of the liquid confinement member.

3. The method according to claim 2, wherein the groove extends around the space.

4. The method according to claim 1, wherein the outlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is arranged to oppose the surface of the substrate during the exposure, and the outlet comprises a groove in the face of the liquid confinement member.

5. The method according to claim 4, wherein the groove extends around the space.

6. The method according to claim 1, wherein a fluid bearing is formed between the liquid confinement member and the substrate during the exposure.

7. The method according to claim 6, wherein the fluid bearing is formed by supplying the gas from the inlet.

8. The method according to claim 6, further comprising removing fluid via a second outlet of the liquid confinement member, that is located closer inward toward the space than is the inlet, the second outlet of the liquid confinement member being arranged to oppose the surface of the substrate during the exposure.

9. The method according to claim 1, further comprising removing fluid via a second outlet of the liquid confinement member, that is located closer inward toward the space than is the inlet, the second outlet of the liquid confinement member being arranged to oppose the surface of the substrate during the exposure.

10. The method according to claim 9, wherein the fluid removed from the second outlet includes liquid.

11. The method according to claim 1, wherein the fluid removed from the outlet includes liquid.

12. The method according to claim 1, wherein the fluid includes gas.

13. The method according to claim 2, wherein the outlet is formed in the face of the liquid confinement member.

14. The method according to claim 6, wherein the fluid bearing supports the weight of the liquid confinement member.

15. The method according to claim 10, wherein the outlet, that is located further outward from the space than is the inlet, removes any liquid which has not been removed from the second outlet.

16. The method according to claim 1, wherein the gas supplied from the inlet assists in containing the liquid.

17. The method according to claim 1, wherein the inlet of the liquid confinement member is below the final surface of the projection system.

18. The method according to claim 17, wherein the outlet of the liquid confinement member is below the final surface of the projection system.

19. The method according to claim 1, wherein the outlet of the liquid confinement member is below the final surface of the projection system.

20. A method used in a liquid immersion lithography system, the method comprising:

containing liquid using a liquid confinement member of the liquid immersion lithography system in a space between a lens of the liquid immersion lithography system and a surface of an object which is moved below the lens and the liquid confinement member;

supplying a gas from an inlet of the liquid confinement member, the inlet being arranged to oppose the surface of the object, and

removing fluid via an outlet of the liquid confinement member, that is located further outward from the space than is the inlet, the outlet being arranged to oppose the surface of the object.

21. The method according to claim 20, wherein the liquid confinement member having the inlet and the outlet surrounds the lens.

22. The method according to claim 20, wherein the object includes a wafer.

23. The method according to claim 20, wherein the gas supplied from the inlet includes pressurized air.

24. The method according to claim 20, wherein the liquid confinement member is flexibly attached to the lens.

25. The method according to claim 20, wherein the liquid confinement member is movable relative to the lens.

26. The method according to claim 20, wherein the inlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is arranged to oppose the surface of the object, and the inlet comprises a groove in the face of the liquid confinement member.

27. The method according to claim 26, wherein the groove extends around the space.

28. The method according to claim 20, wherein the outlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is arranged to oppose the surface of the object, and the outlet comprises a groove in the face of the liquid confinement member.

29. The method according to claim 28, wherein the groove extends around the space.

30. The method according to claim 20, wherein a fluid bearing is formed between the liquid confinement member and the object.

31. The method according to claim 30, wherein the fluid bearing is formed by supplying the gas from the inlet.

32. The method according to claim 30, wherein the fluid bearing supports the weight of the liquid confinement member.

33. The method according to claim 20, further comprising removing fluid via a second outlet of the liquid confinement member, that is closer inward toward the space than is the inlet, the second outlet of the liquid confinement member being arranged to oppose the surface of the object.

34. The method according to claim 33, wherein the fluid removed from the second outlet includes liquid.

35. The method according to claim 33, wherein the outlet, that is located further outward from the space than is the inlet, removes any liquid which has not been removed from the second outlet.

36. The method according to claim 20, wherein the fluid removed from the outlet includes liquid.

37. The method according to claim 20, wherein the gas supplied from the inlet assists in containing the liquid.

38. The method according to claim 20, wherein the inlet of the liquid confinement member is below a final surface of the lens.

39. The method according to claim 38, wherein the outlet of the liquid confinement member is below the final surface of the lens.

40. The method according to claim 20, wherein the outlet of the liquid confinement member is below the final surface of the lens.