Substrate holding apparatus, exposure apparatus, exposing method, and device fabricating method
First Claim
1. A substrate holding apparatus that holds a substrate, which is irradiated by exposure light, comprising:
- a base part;
a support part that is formed on the base part and supports a rear surface of the substrate;
a first circumferential wall that;
is formed on the base part;
has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds a first space that is between the substrate, which is supported by the support part, and the base part;
a second circumferential wall that;
is formed on the base part;
has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and
surrounds the first circumferential wall;
a third circumferential wall that;
is formed on the base part;
has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds the support part and the second circumferential wall;
a fluid flow port that is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall; and
a first suction port that suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall.
1 Assignment
0 Petitions
Accused Products
Abstract
A substrate holding apparatus includes a base part and a support part that is formed on the base part and supports a rear surface of the substrate. A first circumferential wall is formed on the base part, has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part, and surrounds a first space that is between the substrate, which is supported by the support and the base part. A second circumferential wall is formed on the base part, has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween, and surrounds the first circumferential wall. A third circumferential wall is formed on the base part, has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall. A fluid flow port is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall. A first suction port suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall.
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Citations
32 Claims
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1. A substrate holding apparatus that holds a substrate, which is irradiated by exposure light, comprising:
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a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that;
is formed on the base part;
has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds a first space that is between the substrate, which is supported by the support part, and the base part;a second circumferential wall that;
is formed on the base part;
has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and
surrounds the first circumferential wall;a third circumferential wall that;
is formed on the base part;
has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds the support part and the second circumferential wall;a fluid flow port that is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall; and a first suction port that suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. An exposing method that performs an immersion exposure, the method comprising:
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holding a substrate with a substrate holding apparatus; and exposing the substrate, which is held by the substrate holding apparatus; wherein, the substrate holding apparatus comprises; a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that;
is formed on the base part;
has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds a first space that is between the substrate, which is supported by the support part, and the base part;a second circumferential wall that;
is formed on the base part;
has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and
surrounds the first circumferential wall;a third circumferential wall that;
is formed on the base part;
has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and
surrounds the support part and the second circumferential wall;a fluid flow port that is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall; and a first suction port that suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall. - View Dependent Claims (27, 28, 29, 30, 31, 32)
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Specification