Polarization element, method for manufacturing the same, liquid crystal device, and electronic apparatus

• US 8,094,373 B2
• Filed: 08/14/2008
• Issued: 01/10/2012
• Est. Priority Date: 09/12/2007
• Status: Active Grant

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Kumai, Yoshitomo
• Primary Examiner(s): Chapel, Derek S
• Application Number:
  US12/191,340
• Publication Number:
  US 20090066885A1
• Time in Patent Office: 1,244 Days
• Field of Search: None
• US Class Current: 359/485.05
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles
• CPC Class Codes: G02F 1/133548 Wire-grid polarisers

Abstract

A polarization element including a plurality of protection films, one of the plurality of protection films being provided on one of the plurality of metal thin wires. The plurality of metal thin wires includes a first metal thin wire, and a second metal thin wire adjacent to the first metal thin wire. The plurality of protection films includes a protection first film and a second protection film. A first mask is provided between the upper end of the first metal thin wire and the first protection film, and a second mask is provided between the upper end of the second metal thin wire and the second protection film. The first and second protection films form an air gap below the first mask.

Claims

1. A polarization element, comprising:

a base;

a plurality of metal thin wires provided on the base along a predetermined alignment axis; and

a plurality of protection films, one of the plurality of protection films covering one of the plurality of metal thin wires,

wherein the plurality of metal thin wires includes a first metal thin wire and a second metal thin wire, the first metal thin wire and the second metal thin wire being adjacent to each other,

wherein the plurality of protection films includes a first protection film provided on the first metal thin wire and a second protection film provided on the second metal thin wire,

wherein a first mask is provided between the upper end of the first metal thin wire and the first protection film provided on the first metal thin wire, the first mask being a mask through which the first metal thin wire is formed,

wherein a second mask is provided between the upper end of the second metal thin wire and the second protection film provided on the second metal thin wire, the second mask being a mask through which the second metal thin wire is formed,

wherein the first protection film provided on the first metal thin wire covers the first mask and both sidewalls of the first metal thin wire, and the second protection film provided on the second metal thin wire covers the second mask and both sidewalls of the second metal thin wire, wherein a width of a first part in a direction of the alignment axis, the first part being above the first mask, of the first protection film provided on the first metal thin wire is larger than a sum of a width of the first metal thin wire in the direction of the alignment axis and widths of second parts in a direction of the alignment axis, the second parts being on the both sidewalls of the first metal thin wire, of the first protection film provided on the first metal thin wire,

wherein a third part, the third part being on a first sidewall of the sidewalls of the second metal thin wire, of the second protection film provided on the second metal thin wire forms an air gap with one of the second parts of the first protection film provided on the first metal thin wire,

wherein the first sidewall is opposed to one of the sidewalls of the first metal thin wire where the one of the second parts is provided, and

wherein the second and third parts have substantially the same thickness along lengths thereof in an orthogonal direction to the base.

2. The polarization element according to claim 1, wherein the first protection film provided on the first metal thin wire and the second protection film provided on the second metal thin wire contact with each other above the plurality of metal thin wires in the direction of the alignment axis.

3. The polarization element according to claim 2, wherein a plurality of deposited films are formed on an upper surface of the plurality of the protection films so as to form a protection layer.

4. The polarization element according to claim 1, wherein each of the protection films are made of a translucent insulating material.

5. The polarization element according to claim 1, wherein the first mask and the first protection film provided on the first metal thin wire are composed of the same material.

6. A liquid crystal device, comprising:

a pair of substrates;

a liquid crystal layer sandwiched in between the pair of substrates;

The polarization element, according to claim 1, provided between the liquid crystal layer and one of the pair of substrates; and

an alignment film provided between the liquid crystal layer and the polarization element and processed with rubbing treatment.

7. An electronic apparatus comprising the liquid crystal device according to claim 6 as an optical modulator.

8. A method for manufacturing a polarization element, comprising:

a) forming a metal film on a base;

b) forming a patterned mask on the metal film;

c) forming a plurality of metal thin wires provided on the base along a predetermined alignment axis by etching the metal film through the patterned mask; and

d) forming a plurality of protection films, one of the plurality of protection films covering an upper end and both sidewalls of one of the plurality of metal thin wires,

wherein in the step d), the one of the plurality of protection films is formed on an upper end and both sidewalls of the one of the plurality of metal thin wires by a chemical vapor deposition (CVD) method without removing the patterned mask, and a first part, the first part being above the upper end of the one of the plurality of metal thin wires, of the one of the plurality of protection films is allowed to grow by further progressing the formation of the plurality of protection films so as to make a width of the first part of the one of the plurality of protection films in a direction of the alignment axis larger than a sum of a width of the one of the plurality of metal thin wires in the direction of the alignment axis and widths of second parts in the direction of the alignment axis, the second parts being on the both sidewalls of the one of the plurality of metal thin wires, of the one of the plurality of protection films, and

wherein a thickness of the second parts is substantially uniform along lengths thereof in an orthogonal direction to the base.

9. The method for manufacturing a polarization element according to claim 8, wherein a material of the patterned mask is the same as a material of the plurality of protection films.

10. The method for manufacturing a polarization element according to claim 8, wherein a thermal CVD method is used as the chemical vapor deposition method.

11. The method for manufacturing a polarization element according to claim 8, wherein a thickness of the first part in an orthogonal direction to the base is larger than or equal to 50 nm.