Analysis instrument
First Claim
1. A microfluidic processing device comprising:
- a reaction chamber;
a carrier layer comprising piercable material;
a sample loading chamber into which a sample is injectable;
a piercable process layer; and
an overspill cavity;
wherein the sample loading chamber is formed between the reaction chamber, which is operatively connected to the sample loading chamber, and the piercable process layer; and
wherein the overspill cavity is formed from a space between the piercable process layer and the carrier layer and configured to accept any overspill.
3 Assignments
0 Petitions
Accused Products
Abstract
An analysis instrument for processing a microfluidic device, having sample storage means, a microfluidic device holder, sample loading means for loading sample into a microfluidic device disposed in the holder, processing means for enabling a reaction in a microfluidic device, and detection means for detecting and/or measuring the reaction is disclosed. The microfluidic device holder is adapted to hold the microfluidic device including a tape in position for processing and/or detection. A microfluidic processing device is also disclosed which includes a reaction chamber, and a sample loading chamber into which a sample is injectable. The reaction chamber is operatively connected to the sample loading chamber. A cover extends across at least part of the sample loading chamber. The cover and the reaction chamber include pierceable material and are separated by an overspill cavity configured to accept any overspill of an injected sample. A kit is also disclosed which has the analysis instrument and the microfluidic processing device as described above.
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Citations
7 Claims
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1. A microfluidic processing device comprising:
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a reaction chamber; a carrier layer comprising piercable material; a sample loading chamber into which a sample is injectable; a piercable process layer; and an overspill cavity; wherein the sample loading chamber is formed between the reaction chamber, which is operatively connected to the sample loading chamber, and the piercable process layer; and wherein the overspill cavity is formed from a space between the piercable process layer and the carrier layer and configured to accept any overspill. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification