Display devices including an oxide semiconductor thin film transistor
First Claim
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1. A display device, comprising:
- at least one thin film transistor and at least one storage capacitor, both on a substrate, whereinthe at least one storage capacitor includes a storage electrode formed of a transparent oxide semiconductor, and a pixel electrode over the storage electrode, the pixel electrode being separated from the storage electrode by a desired distance,the at least one film transistor includes a gate, a channel layer corresponding to the gate, and a gate insulating layer between the gate and the channel layer, the channel layer and the storage electrode being on a same surface of the gate insulating layer, andthe channel layer is formed of the transparent oxide semiconductor.
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Abstract
A display device including an oxide semiconductor thin film transistor is provided. The display device includes at least one thin film transistor, and at least one storage capacitor. The storage capacitor includes a storage electrode formed of a transparent oxide semiconductor, and a pixel electrode over the storage electrode. The pixel electrode may be separated from the storage electrode by a desired distance.
98 Citations
22 Claims
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1. A display device, comprising:
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at least one thin film transistor and at least one storage capacitor, both on a substrate, wherein the at least one storage capacitor includes a storage electrode formed of a transparent oxide semiconductor, and a pixel electrode over the storage electrode, the pixel electrode being separated from the storage electrode by a desired distance, the at least one film transistor includes a gate, a channel layer corresponding to the gate, and a gate insulating layer between the gate and the channel layer, the channel layer and the storage electrode being on a same surface of the gate insulating layer, and the channel layer is formed of the transparent oxide semiconductor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A display device, comprising:
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at least one thin film transistor including a channel layer on a substrate and formed of a transparent oxide semiconductor, a gate insulating layer covering the channel layer, a gate on the gate insulating layer and corresponding to the channel layer, an interlayer dielectric layer covering the gate, source and drain electrodes on the interlayer dielectric layer electrically connected to opposing sides of the channel layer, and a passivation layer covering the interlayer dielectric layer and the source and drain electrodes, and at least one storage capacitor including a storage electrode on the substrate and formed of the transparent oxide semiconductor, the gate insulating layer covering the storage electrode, a storage electrode wiring on and electrically connected to the gate insulating layer, the interlayer dielectric layer covering the storage electrode wiring, the passivation layer on the interlayer dielectric layer, and a pixel electrode on the passivation layer. - View Dependent Claims (20, 21, 22)
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Specification