Medical implants and methods

• US 8,105,358 B2
• Filed: 07/30/2008
• Issued: 01/31/2012
• Est. Priority Date: 02/04/2008
• Status: Active Grant

• Current Assignee: Kyphon SARL (Medtronic Plc)
• Original Assignee: Kyphon SARL (Medtronic Plc)
• Inventors: Phan, Christopher U.
• Primary Examiner(s): Robert, Eduardo C
• Assistant Examiner(s): PLIONIS, NICHOLAS J
• Application Number:
  US12/182,429
• Publication Number:
  US 20090198337A1
• Time in Patent Office: 1,280 Days
• Field of Search: 606246-279, 623 1711- 1716
• US Class Current: 606/249
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 2017/0256 for the spine
• CPC Class Codes: A61B 2090/061 for measuring dimensions, e.g. length
• CPC Class Codes: A61B 90/06 Measuring instruments not otherwise provided for
• CPC Class Codes: A61F 2/4455 for the fusion of spinal bodies, e.g. intervertebral fusion of adjacent spinal bodies, e.g. fusion cages intervertebral discs A61F2/442
• CPC Class Codes: A61F 2/4611 of spinal prostheses
• CPC Class Codes: A61F 2/4657 Measuring instruments used for implanting artificial joints for surgical instruments A61B90/06
• CPC Class Codes: A61F 2002/30507 using a threaded locking member, e.g. a locking screw or a set screw
• CPC Class Codes: A61F 2002/3055 for adjusting length
• CPC Class Codes: A61F 2002/30556 for adjusting thickness
• CPC Class Codes: A61F 2002/30579 with mechanically expandable devices, e.g. fixation devices
• CPC Class Codes: A61F 2002/4658 for measuring dimensions, e.g. length
• CPC Class Codes: A61F 2220/0025 Connections or couplings between prosthetic parts, e.g. between modular parts; Connecting elements
• CPC Class Codes: A61F 2250/0009 for adjusting thickness

Abstract

An apparatus includes a spacer, a proximal retention member, a distal retention member, and an actuator. The spacer is configured to engage adjacent spinous processes. The proximal retention member is coupled to the spacer such that a portion of the proximal retention member is in contact with a proximal surface of the spacer. An axis within a plane defined by a first surface of the distal retention member is non-parallel to and non-normal to a longitudinal axis of the spacer. The distal retention member is movably coupled to the spacer such that a second surface of the distal retention member contacts a distal surface of the spacer. The actuator is movably coupled to the spacer and is configured to move relative to the spacer along the longitudinal axis. An actuation surface of the actuator is slidably coupled to and substantially parallel to the first surface of the distal retention member.

Claims

1. A spinal implant, comprising:

a spacer configured to engage a first spinous process and a second spinous process;

the spacer having a proximal surface and a distal surface opposite the proximal surface;

a proximal retention member disposed proximally relative to the spacer and movably coupled to the spacer such that a portion of the proximal retention member is in contact with the proximal surface of the spacer;

a distal retention member having a first surface and a second surface, the distal retention member disposed distally relative to the spacer and movably coupled to the spacer such that the second surface is in contact with the distal surface of the spacer;

a drive screw extending along a longitudinal axis;

an axis within a plane defined by the first surface of the distal retention member being non-parallel to and non-normal to the longitudinal axis;

an actuator segment disposed distally relative to the distal retention member;

the actuator segment movably coupled to the spacer for movement relative to the spacer along the longitudinal axis;

the actuator segment having an actuation surface slidably coupled to and substantially parallel to the first surface of the distal retention member;

wherein the distal retention member is separate and distinct from both the spacer and the actuator segment;

wherein the proximal retention member is separate and distinct from both the spacer and the actuator segment;

wherein the implant is changeable from a retracted configuration to a deployed configuration;

wherein, in the retracted configuration;

the actuator segment is spaced from the distal surface of the spacer and the distal retention member longitudinally separates the actuator segment from the spacer;

an outer surface of the proximal retention member and an outer surface of the distal retention member are disposed relatively closer to the longitudinal axis;

the drive screw extends into the actuator segment a first distance;

wherein, in the deployed configuration;

the actuator segment abuts the distal surface of the spacer on a first side of the longitudinal axis and the distal retention member is disposed between the actuator segment and the distal surface of the spacer on a second side of the longitudinal axis;

the outer surface of the proximal retention member and the outer surface of the distal retention member are disposed relatively farther from the longitudinal axis;

the drive screw extends into the actuator segment a second distance larger than the first distance.

2. The spinal implant of claim 1 wherein the proximal retention member and the distal retention member are configured to collectively limit movement of the spacer along the longitudinal axis and relative to the first spinous process and the second spinous process when the implant is in the deployed configuration.

3. The spinal implant of claim 1 wherein the distal retention member moveably mates to the spacer at a first tongue-and-groove connection;

wherein the proximal retention member moveably mates to the spacer at a second tongue-and-groove connection.

4. The spinal implant of claim 1 wherein, in the retracted configuration, the outer surface of the distal retention member and the outer surface of the proximal retention member are both generally aligned with an outer surface of the spacer such that the outer surfaces lie in a common plane parallel to the longitudinal axis.

5. The spinal implant of claim 1 wherein:

the first surface of the distal retention member defines a groove;

the actuation surface of the actuator segment includes a protrusion configured to be matingly received within the groove;

the groove and the protrusion collectively configured to allow movement of the distal retention member relative to the actuator segment in a direction substantially parallel to the first surface of the distal retention member;

the groove and the protrusion collectively configured to limit movement of the distal retention member relative to the actuator segment in a direction substantially normal to the first surface of the distal retention member.

6. The spinal implant of claim 5 wherein:

the groove of the first surface has a trapezoidal cross-sectional shape;

the protrusion of the actuation surface has a trapezoidal cross-sectional shape.

7. The spinal implant of claim 1, wherein:

the second surface of the distal retention member is slidably coupled to the distal surface of the spacer;

the second surface of the distal retention member defines a groove;

the distal surface of the spacer includes a protrusion configured to be matingly received within the groove;

the groove and the protrusion collectively configured to allow movement of the distal retention member relative to the spacer in a direction substantially parallel to the second surface of the distal retention member;

the groove and the protrusion collectively configured to limit movement of the distal retention member relative to the spacer in a direction substantially normal to the second surface of the distal retention member.

8. The spinal implant of claim 1 wherein:

the distal surface of the spacer is substantially normal to the longitudinal axis;

the second surface of the distal retention member is slidably coupled to and substantially parallel to the distal surface of the spacer.

9. The spinal implant of claim 1 wherein the actuator segment tapers inward toward the longitudinal axis in a direction away from the spacer.