Microlithographic projection exposure apparatus
First Claim
1. A method, comprising:
- providing a microlithographic projection exposure apparatus having an illumination system and a projection objective;
illuminating a pupil plane of the illumination system with light; and
modifying, in a plane of the projection objective, at least one parameter of the light passing through the plane of the projection objective,wherein;
the at least one parameter is selected from the group consisting of a phase of the light, an amplitude of the light and a polarization of the light;
at least two diffraction orders of the light are modified in mutually different ways so that a mask-induced loss in image contrast obtained in the imaging of the structures is reduced compared to performing the method without modifying the at least one parameter, anda lateral offset between a first interference image and a second interference image is reduced compared to performing the method without modifying the at least one parameter, the first interference image being obtained in a first illumination direction, and the second interference image being obtained in a second illumination direction.
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Accused Products
Abstract
The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
15 Citations
24 Claims
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1. A method, comprising:
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providing a microlithographic projection exposure apparatus having an illumination system and a projection objective; illuminating a pupil plane of the illumination system with light; and modifying, in a plane of the projection objective, at least one parameter of the light passing through the plane of the projection objective, wherein; the at least one parameter is selected from the group consisting of a phase of the light, an amplitude of the light and a polarization of the light; at least two diffraction orders of the light are modified in mutually different ways so that a mask-induced loss in image contrast obtained in the imaging of the structures is reduced compared to performing the method without modifying the at least one parameter, and a lateral offset between a first interference image and a second interference image is reduced compared to performing the method without modifying the at least one parameter, the first interference image being obtained in a first illumination direction, and the second interference image being obtained in a second illumination direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method, comprising:
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providing a microlithographic projection exposure apparatus having an illumination system and a projection objective; illuminating a pupil plane of the illumination system with light; and modifying, in a plane of the projection objective, a polarization of the light passing through the plane of the projection objective, wherein; at least two diffraction orders of the light are modified in mutually different ways, and a lateral offset between a first interference image and a second interference image is reduced compared to performing the method without modifying the polarization of the light passing through the plane of the projection objective, the first interference image being obtained in a first illumination direction, and the second interference image being obtained in a second illumination direction. - View Dependent Claims (24)
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Specification