Beam splitter apparatus and system

• US 8,107,168 B2
• Filed: 04/28/2009
• Issued: 01/31/2012
• Est. Priority Date: 09/14/2006
• Status: Expired due to Fees

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Murnan, Andrew J., Faklis, Dean
• Primary Examiner(s): Pinkney, Dawayne
• Application Number:
  US12/431,517
• Publication Number:
  US 20090213466A1
• Time in Patent Office: 1,008 Days
• Field of Search: 359/629, 359/634, 359636-640, 359/669, 359/831, 359833-834
• US Class Current: 359/629
• CPC Class Codes: G02B 17/04 using prisms only
• CPC Class Codes: G02B 27/106 for splitting or combining a plurality of identical beams or images, e.g. image replication
• CPC Class Codes: G02B 27/143 using macroscopically faceted or segmented reflective surfaces
• CPC Class Codes: G02B 27/144 using partially transparent surfaces without spectral selectivity G02B27/147 takes precedence
• CPC Class Codes: G02B 27/145 having sequential partially reflecting surfaces
• CPC Class Codes: G02B 5/122 cube corner, trihedral or triple reflector type
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291
• CPC Class Codes: G03F 7/7055 Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Abstract

A beam splitter apparatus comprises a beam splitter and a plurality of prisms disposed about the beam splitter. The beam splitter apparatus is configured to split an incident laser beam into a plurality of beamlets exhibiting substantially equal energy and traversing substantially equal optical path lengths through the beam splitter apparatus.

Claims

1. A system comprising:

a light source to provide an incident light beam; and

a beam splitter apparatus to split the incident light beam into at least (2ⁿ−

1) beamlets, n being at least 2, wherein the beam splitter apparatus comprises;

a beam splitter; and

(2n−

2) prisms in optical contact with the beam splitter for redirecting light to the beam splitter.

2. The system of claim 1, wherein the beamlets have substantially equal energy and optical path lengths.

3. The system of claim 1, wherein each prism is selected from a group consisting of:

a cube prism, a pentaprism, and a porroprism.

4. The system of claim 1, wherein the beam splitter is a cube beam splitter.

5. The system of claim 1, and further comprising a layer of index matching fluid disposed between the prisms and the beam splitter.

6. The system of claim 1, wherein the light beam is a laser beam.

7. The system of claim 1, and further comprising:

a focusing portion configured to arrange the beamlets into an array of beamlets.

8. The system of claim 1, and further comprising:

a layer of a multiphoton curable photoreactive composition; and

a focusing lens defining a field of view within the layer, the field of view comprising a plurality of subfields, wherein at least one of the beamlets cures a region of the layer within at least one of the subfields.