Thin-film photovoltaic devices
First Claim
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1. A method of producing a thin-film photovoltaic device, comprising:
- forming on a substrate a first thin-film absorber layer using a first deposition process; and
forming on the first thin-film absorber layer a second thin-film absorber layer using a second deposition process different from the first deposition process, wherein said second thin-film absorber layer has a smaller concentration of defects than the first thin-film absorber layer, and wherein the first and second thin-film absorber layers are each photovoltaically active regions, one of the first or second deposition processes being selected from the group consisting of a reacted particle deposition process, a reacted target deposition process and a co-evaporation deposition process.
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Abstract
A method is provided for producing a thin-film photovoltaic device. The method includes forming on a substrate a first thin-film absorber layer using a first deposition process. A second thin-film absorber layer is formed on the first thin-film absorber layer using a second deposition process different from the first deposition process. The first and second thin-film absorber layers are each photovoltaically active regions and the second thin-film absorber layer has a smaller concentration of defects than the first thin-film absorber layer.
57 Citations
13 Claims
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1. A method of producing a thin-film photovoltaic device, comprising:
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forming on a substrate a first thin-film absorber layer using a first deposition process; and forming on the first thin-film absorber layer a second thin-film absorber layer using a second deposition process different from the first deposition process, wherein said second thin-film absorber layer has a smaller concentration of defects than the first thin-film absorber layer, and wherein the first and second thin-film absorber layers are each photovoltaically active regions, one of the first or second deposition processes being selected from the group consisting of a reacted particle deposition process, a reacted target deposition process and a co-evaporation deposition process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of producing a thin-film photovoltaic device, comprising:
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forming on a substrate a first thin-film absorber layer using a first deposition process; and forming on the first thin-film absorber layer a second thin-film absorber layer using a second deposition process different from the first deposition process, wherein said second thin-film absorber layer has a slower recombination rate than the first thin-film absorber layer, and wherein the first and second thin-film absorber layers are each photovoltaically active regions, wherein said second deposition process is a reacted target physical deposition process. - View Dependent Claims (11)
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12. A method of producing a thin-film photovoltaic device, comprising:
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forming on a substrate a first thin-film absorber layer using a first deposition process; and forming on the first thin-film absorber layer a second thin-film absorber layer using a second deposition process different from the first deposition process, wherein said first and second thin-film absorber layers have essentially the same chemical composition and optical bandgap, and wherein the first and second thin-film absorber layers are each photovoltaically active regions, wherein said second deposition process is a reacted target physical deposition process. - View Dependent Claims (13)
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Specification