Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
First Claim
1. A computer-implemented method for detecting defects in a design pattern of a reticle, comprising:
- acquiring images of the reticle for different values of a lithographic variable, wherein the images comprise two or more reference images obtained at nominal values and one or more modulated images;
generating a composite reference image from the two or more reference images, wherein the composite reference image comprises image data that is different than image data of the two or more reference images, and wherein the composite reference image does not comprise defects;
comparing at least two of the images, wherein the at least two of the images comprise the composite reference image; and
determining if a detect is present in the design pattern using results of said comparing.
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Accused Products
Abstract
Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
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Citations
17 Claims
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1. A computer-implemented method for detecting defects in a design pattern of a reticle, comprising:
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acquiring images of the reticle for different values of a lithographic variable, wherein the images comprise two or more reference images obtained at nominal values and one or more modulated images; generating a composite reference image from the two or more reference images, wherein the composite reference image comprises image data that is different than image data of the two or more reference images, and wherein the composite reference image does not comprise defects; comparing at least two of the images, wherein the at least two of the images comprise the composite reference image; and determining if a detect is present in the design pattern using results of said comparing. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A computer-implemented method for detecting defects in a design pattern of a reticle, comprising:
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acquiring images of an entire swath of dies printed on a wafer using the reticle, wherein at least two of the dies are printed at different values of a lithographic variable, wherein the dies comprise modulated dies and two or more reference dies, and wherein a number of the modulated dies in the entire swath is greater than or equal to a number of the two or more reference dies in the entire swath; generating a composite reference image from the images of the two or more reference dies, wherein the composite reference image does not comprise defects; subsequent to said acquiring, comparing at least two of the images, wherein one of the at least two of the images used for said comparing comprises the composite reference image; and determining if a defect is present in the design pattern using results of said comparing. - View Dependent Claims (15, 16)
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17. A system configured to detect defects in a design pattern of a reticle, comprising:
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an inspection tool configured to acquire images of the reticle for different values of a lithographic variable, wherein the images comprise two or more reference images obtained at nominal values and one or more modulated images; a processor configured to receive the images; and a storage medium comprising program instructions executable on the processor for performing a computer-implemented method, wherein the computer-implemented method comprises; generating a composite reference image from the two or more reference images, wherein the composite reference image comprises image data that is different than image data of the two or more reference images, and wherein the composite reference image does not comprise defects; comparing at least two of the images, wherein the at least two of the images comprise the composite reference image; and determining if a defect is present in the design pattern using results of said comparing.
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Specification