Photon induced formation of metal comprising elongated nanostructures
First Claim
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1. A method for forming in a reaction chamber at least one metal comprising elongated nanostructure onto a substrate, the method comprising:
- converting at least part of a metal surface layer of a substrate into a metal halide compound;
exposing the metal halide compound to a photon comprising ambient generated by a plasma comprising at least one gas selected from the group consisting of He and Ar, whereby volatile metal halide products are formed in the reaction chamber at a concentration above a saturation level; and
redepositing the volatile metal halide products on the substrate, whereby at least one metal comprising elongated nanostructure is formed.
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Abstract
The preferred embodiments provide a method for forming at least one metal comprising elongated nanostructure on a substrate. The method comprises exposing a metal halide compound surface to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure. The preferred embodiments also provide metal comprising elongated nanostructures obtained by the method according to preferred embodiments.
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27 Claims
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1. A method for forming in a reaction chamber at least one metal comprising elongated nanostructure onto a substrate, the method comprising:
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converting at least part of a metal surface layer of a substrate into a metal halide compound; exposing the metal halide compound to a photon comprising ambient generated by a plasma comprising at least one gas selected from the group consisting of He and Ar, whereby volatile metal halide products are formed in the reaction chamber at a concentration above a saturation level; and redepositing the volatile metal halide products on the substrate, whereby at least one metal comprising elongated nanostructure is formed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification