Flexible substrates having a thin-film barrier
First Claim
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1. An apparatus, comprising:
- a flexible substrate;
an inorganic barrier layer covering at least a portion of the flexible substrate, wherein the inorganic barrier layer comprises at least one of a tin fluorophosphate material, chalcogenide material, phosphate material, borate material, bismuth zinc borate material, glass, borosilicate glass, a tellurite material, and a material including a composition of about 72 parts SiO2, about 1 part Al2O3, about 25 parts B2O3, about 0.5 parts Li2O, about 0.5 parts Na2O, and about 1 part K2O,wherein at least one of;
(i) a modulus of the barrier layer is about 30 GPa to about 120 GPa; and
(ii) a thickness of the barrier layer is less than about 10 um.
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Abstract
Methods and apparatus provide for: applying an inorganic barrier layer to at least a portion of a flexible substrate, the barrier layer being formed from a low liquidus temperature (LLT) material; and sintering the inorganic barrier layer while maintaining the flexible substrate below a critical temperature.
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10 Claims
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1. An apparatus, comprising:
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a flexible substrate; an inorganic barrier layer covering at least a portion of the flexible substrate, wherein the inorganic barrier layer comprises at least one of a tin fluorophosphate material, chalcogenide material, phosphate material, borate material, bismuth zinc borate material, glass, borosilicate glass, a tellurite material, and a material including a composition of about 72 parts SiO2, about 1 part Al2O3, about 25 parts B2O3, about 0.5 parts Li2O, about 0.5 parts Na2O, and about 1 part K2O, wherein at least one of;
(i) a modulus of the barrier layer is about 30 GPa to about 120 GPa; and
(ii) a thickness of the barrier layer is less than about 10 um. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification