System and method for micro-electromechanical operation of an interferometric modulator
First Claim
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1. A method of making a microelectromechanical system (MEMS) device, comprising:
- forming a first electrode;
depositing a dielectric material over at least a portion of the first electrode;
removing a portion of the dielectric material from over the first electrode, thereby forming a variable thickness dielectric layer having a thickness variation that varies across the first electrode, wherein the thickness variation is manifested as peaks and valleys with the distance between the top of the peak and the bottom of the valley being in the range of 100 Å
to 3,000 Å
; and
forming a second electrode over at least a portion of the variable thickness dielectric layer.
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Abstract
An interferometric modulator is formed by a stationary layer and a mirror facing the stationary layer. The mirror is movable between the undriven and driven positions. Landing pads, bumps or spring clips are formed on at least one of the stationary layer and the mirror. The landing pads, bumps or spring clips can prevent the stationary layer and the mirror from contacting each other when the mirror is in the driven position. The spring clips exert force on the mirror toward the undriven position when the mirror is in the driven position and in contact with the spring clips.
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Citations
30 Claims
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1. A method of making a microelectromechanical system (MEMS) device, comprising:
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forming a first electrode; depositing a dielectric material over at least a portion of the first electrode; removing a portion of the dielectric material from over the first electrode, thereby forming a variable thickness dielectric layer having a thickness variation that varies across the first electrode, wherein the thickness variation is manifested as peaks and valleys with the distance between the top of the peak and the bottom of the valley being in the range of 100 Å
to 3,000 Å
; andforming a second electrode over at least a portion of the variable thickness dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of making an interferometric modulator, comprising:
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forming a first electrode; depositing a dielectric layer over at least a portion of the first electrode; removing a portion of the dielectric layer to form a variable thickness dielectric layer having a thickness variation that varies across the first electrode, wherein the thickness variation is manifested as peaks and valleys with the distance between the top of the peak and the bottom of the valley being in the range of 100 Å
to 3,000 Å
;depositing a sacrificial layer over the variable thickness dielectric layer; planarizing the sacrificial layer; and forming a second electrode over the sacrificial layer. - View Dependent Claims (22, 23, 24, 25)
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26. A method of making an interferometric modulator, comprising:
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forming a first electrode; depositing a dielectric layer over at least a portion of the first electrode; removing a portion of the dielectric layer to form a variable thickness dielectric layer having a thickness variation that varies across the first electrode, wherein the thickness variation is manifested as peaks and valleys with the distance between the top of the peak and the bottom of the valley being in the range of 100 Å
to 3,000 Å
;depositing a sacrificial layer over the a variable thickness dielectric layer; depositing a planarization layer over the sacrificial layer; and forming a second electrode over the planarization layer. - View Dependent Claims (27, 28, 29, 30)
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Specification