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Method of forming a micro-electromechanical system (MEMS) having a gap stop

  • US 8,119,431 B2
  • Filed: 12/08/2009
  • Issued: 02/21/2012
  • Est. Priority Date: 12/08/2009
  • Status: Expired due to Fees
First Claim
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1. A method of forming a micro-electromechanical system (MEMS) comprising:

  • providing a cap substrate;

    providing a support substrate;

    depositing a conductive material over the support substrate;

    patterning the conductive material to leave a conductive portion that forms a gap stop and a contact, wherein the gap stop is separated form the contact by an opening;

    forming a bonding material over the contact and in the opening, wherein the gap stop and the contact prevent the bonding material from extending outside the opening; and

    attaching the cap substrate to the support substrate by the step of forming the bonding material;

    wherein forming the bonding material comprises;

    forming a semiconductor layer over the conductive material; and

    heating the cap substrate and the semiconductor layer to form the bonding material and bond the cap substrate to the support substrate; and

    further comprising forming a stack over the conductive material wherein the step of forming the semiconductor layer is part of the step of forming the stack;

    wherein the step of forming the stack over the conductive portion further comprises;

    forming a seed layer comprising silicon over the conductive portion; and

    forming a first layer comprising silicon and germanium over the seed layer; and

    wherein the step of forming the semiconductor layer further comprises forming a second layer comprising germanium over the first layer.

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